| Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links  |
| Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
| Mao, M.; Wang, Y.N.; Bogaerts, A. |
Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications |
2011 |
Journal of physics: D: applied physics |
44 |
20 |
UA library record; WoS full record; WoS citing articles |
| Neyts, E.C.; van Duin, A.C.T.; Bogaerts, A. |
Changing chirality during single-walled carbon nanotube growth : a reactive molecular dynamics/Monte Carlo study |
2011 |
Journal of the American Chemical Society |
133 |
116 |
UA library record; WoS full record; WoS citing articles |
| De Bie, C.; Verheyde, B.; Martens, T.; van Dijk, J.; Paulussen, S.; Bogaerts, A. |
Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge |
2011 |
Plasma processes and polymers |
8 |
70 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 1 : transient behaviour of electrodynamics and power deposition |
2012 |
Journal of physics: D: applied physics |
45 |
57 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 2 : radial uniformity of the plasma characteristics |
2012 |
Journal of physics: D: applied physics |
45 |
15 |
UA library record; WoS full record; WoS citing articles |
| Lindner, H.; Murtazin, A.; Groh, S.; Niemax, K.; Bogaerts, A. |
Simulation and experimental studies on plasma temperature, flow velocity, and injector diameter effects for an inductively coupled plasma |
2011 |
Analytical chemistry |
83 |
34 |
UA library record; WoS full record; WoS citing articles |
| Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
| Neyts, E.C.; van Duin, A.C.T.; Bogaerts, A. |
Insights in the plasma-assisted growth of carbon nanotubes through atomic scale simulations : effect of electric field |
2012 |
Journal of the American Chemical Society |
134 |
56 |
UA library record; WoS full record; WoS citing articles |
| Aghaei, M.; Lindner, H.; Bogaerts, A. |
Effect of a mass spectrometer interface on inductively coupled plasma characteristics : a computational study |
2012 |
Journal of analytical atomic spectrometry |
27 |
18 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Bogaerts, A. |
Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) |
2012 |
Plasma processes and polymers |
9 |
5 |
UA library record; WoS full record; WoS citing articles |
