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Stable polyoxometalate insertion within the mesoporous metal organic framework MIL-100(Fe)”. Canioni R, Roch-Marchal C, Sécheresse F, Horcajada P, Serre C, Hardi-Dan M, Férey G, Grenèche J-M, Lefebvre F, Chang J-S, Hwang Y-K, Lebedev O, Turner S, Van Tendeloo G, Journal of materials chemistry 21, 1226 (2011). http://doi.org/10.1039/c0jm02381g
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Au@MOF-5 and Au/Mox@MOF-5 (M = Zn, Ti, x = 1, 2) : preparation and microstructural characterisation”. Müller M, Turner S, Lebedev OI, Wang Y, Van Tendeloo G, Fischer RA, European journal of inorganic chemistry , 1876 (2011). http://doi.org/10.1002/ejic.201001297
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Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications”. Mao M, Wang YN, Bogaerts A, Journal of physics: D: applied physics 44, 435202 (2011). http://doi.org/10.1088/0022-3727/44/43/435202
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Coherent relativistic wake wave of a charged object moving steadily in a plasma”. Wang Y, Yu MY, Chen ZY, Physica scripta 84, 025501 (2011). http://doi.org/10.1088/0031-8949/84/02/025501
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Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 1 : transient behaviour of electrodynamics and power deposition”. Zhang Y-R, Xu X, Bogaerts A, Wang Y-N, Journal of physics: D: applied physics 45, 015202 (2012). http://doi.org/10.1088/0022-3727/45/1/015202
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Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 2 : radial uniformity of the plasma characteristics”. Zhang Y-R, Xu X, Bogaerts A, Wang Y-N, Journal of physics: D: applied physics 45, 015203 (2012). http://doi.org/10.1088/0022-3727/45/1/015203
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The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 21, 025008 (2012). http://doi.org/10.1088/0963-0252/21/2/025008
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