| Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links  |
| De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. |
Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations |
2011 |
Plasma sources science and technology |
20 |
38 |
UA library record; WoS full record; WoS citing articles |
| Si, X.-J.; Zhao, S.-X.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulations of frequency effects on nonlinear harmonics in inductively coupled plasma |
2011 |
Physics of plasmas |
18 |
7 |
UA library record; WoS full record; WoS citing articles |
| Apolinario, S.W.S.; Peeters, F.M. |
Binary dusty plasma Coulomb balls |
2011 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
83 |
10 |
UA library record; WoS full record; WoS citing articles |
| Bultinck, E.; Bogaerts, A. |
Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model |
2011 |
Plasma sources science and technology |
20 |
7 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Bogaerts, A.; Shamiryan, D. |
Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma |
2011 |
Plasma processes and polymers |
8 |
5 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
| De Bie, C.; Verheyde, B.; Martens, T.; van Dijk, J.; Paulussen, S.; Bogaerts, A. |
Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge |
2011 |
Plasma processes and polymers |
8 |
70 |
UA library record; WoS full record; WoS citing articles |
| Nelissen, K.; Partoens, B.; Peeters, F.M. |
Influence of an ellipsoid on the angular order in a two-dimensional cluster |
2011 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
84 |
|
UA library record; WoS full record |
| Tkachenko, D.V.; Sheridan, T.E.; Misko, V.R. |
Dispersion relations for circular single and double dusty plasma chains |
2011 |
Physics of plasmas |
18 |
7 |
UA library record; WoS full record; WoS citing articles |
| Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Bogaerts, A. |
Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) |
2012 |
Plasma processes and polymers |
9 |
5 |
UA library record; WoS full record; WoS citing articles |
