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| Author | Oleshko, V.P.; Gijbels, R.H.; Bilous, V.M.; Jacob, W.A.; Alfimov, M.V. | ||||
| Title | Evolution of impurity clusters and photographic sensitivity | Type | A3 Journal article | ||
| Year | 2000 | Publication | Zhurnal nauchnoj prikladnoj fotografii i kinematografii | Abbreviated Journal | |
| Volume | 45 | Issue | 2 | Pages | 1-11 |
| Keywords | A3 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
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| Corporate Author | Thesis | ||||
| Publisher | Place of Publication | Editor | |||
| Language | Wos | Publication Date | 0000-00-00 | ||
| Series Editor | Series Title | Abbreviated Series Title | |||
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| ISSN | ISBN | Additional Links  |
UA library record | ||
| Impact Factor | Times cited | Open Access | |||
| Notes | Approved | Most recent IF: NA | |||
| Call Number | UA @ lucian @ c:irua:34084 | Serial | 1100 | ||
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