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Title
Year
Publication
Volume
Times cited
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Zhao, S.-X.
;
Gao, F.
;
Wang, Y.-N.
;
Bogaerts, A.
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF
4
plasma
2013
Plasma sources science and technology
22
11
UA library record
;
WoS full record
;
WoS citing articles