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Author | Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. | ||||
Title | Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: comparison between Ar and SiH4 | Type | A1 Journal article | ||
Year | 2000 | Publication | Journal of applied physics | Abbreviated Journal | J Appl Phys |
Volume | 87 | Issue | 8 | Pages | 3628-3636 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | |||||
Address | |||||
Corporate Author | Thesis | ||||
Publisher | American Institute of Physics | Place of Publication | New York, N.Y. | Editor ![]() |
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Language | Wos | 000086169500003 | Publication Date | 2002-07-26 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0021-8979; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 2.068 | Times cited | 14 | Open Access | |
Notes | Approved | Most recent IF: 2.068; 2000 IF: 2.180 | |||
Call Number | UA @ lucian @ c:irua:34074 | Serial | 3061 | ||
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