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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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Electron energy-loss spectroscopy study of NiTi shape memory alloys”. Yang ZQ, Schryvers D, Materials science and engineering: part A: structural materials: properties, microstructure and processing 481, 214 (2008). http://doi.org/10.1016/j.msea.2006.12.227
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Electron-microscopy and the structural studies of superconducting materials and fullerites”. Van Tendeloo G, Amelinckx S, NATO Advanced Study Institutes series: series E : applied sciences T2 –, NATO Advanced Study Institute on Materials and crystallographic Aspects, of HT(c)-Superconductivity, May 17-30, 1993, Erice, Italy , 521 (1994)
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Electron microscopy characterisation of erbium silicide-thin films grown on a Si(111) substrate”. Frangis N, Van Tendeloo G, van Landuyt J, Muret P, Nguyen TTA, Applied surface science 102, 163 (1996). http://doi.org/10.1016/0169-4332(96)00040-2
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Electrons in a periodic magnetic field”. Ibrahim IS, Peeters FM, Surface science : a journal devoted to the physics and chemistry of interfaces 361/362, 341 (1996). http://doi.org/10.1016/0039-6028(96)00417-7
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EM characterization of precipitates in as-cast and annealed Ni45.5Ti45.5Nb9 shape memory alloys”. Shi H, Frenzel J, Schryvers D, Materials science forum 738/739, 113 (2013). http://doi.org/10.4028/www.scientific.net/MSF.738-739.113
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EM, XPS and LEED study of deposition of Ag on hydrogenated Si substrate prepared by wet chemical treatments”. Zhang XB, Vasiliev AL, Van Tendeloo G, He Y, Yu L-M, Thiry PA, Surface science : a journal devoted to the physics and chemistry of interfaces 340, 317 (1995). http://doi.org/10.1016/0039-6028(95)00699-0
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Empirical evaluation of metal deposition for the analysis of organic compounds with static secondary ion mass spectrometry (S-SIMS)”. de Mondt R, Adriaensen L, Vangaever F, Lenaerts J, van Vaeck L, Gijbels R, Applied surface science 252, 6652 (2006). http://doi.org/10.1016/j.apsusc.2006.02.110
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Engineered spatial inversion symmetry breaking in an oxide heterostructure built from isosymmetric room-temperature magnetically ordered components”. Alaria J, Borisov P, Dyer MS, Manning TD, Lepadatu S, Cain MG, Mishina ED, Sherstyuk NE, Ilyin NA, Hadermann J, Lederman D, Claridge JB, Rosseinsky MJ;, Chemical science 5, 1599 (2014). http://doi.org/10.1039/c3sc53248h
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Epitaxial growth of \beta-SiC on ion-beam synthesized \beta-SiC : structural characterization”. Romano-Rodriguez A, Perez-Rodriguez A, Serre C, van Landuyt J, et al, Materials science forum T2 –, International Conference on Silicon Carbide and Related Materials, OCT 10-15, 1999, RES TRIANGLE PK, NORTH CAROLINA 338-3, 309 (2000)
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Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation”. Van Laer K, Tinck S, Samara V, de Marneffe JF, Bogaerts A, Plasma sources science and technology 22, 025011 (2013). http://doi.org/10.1088/0963-0252/22/2/025011
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Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model”. Kozák T, Bogaerts A, Plasma sources science and technology 24, 015024 (2015). http://doi.org/10.1088/0963-0252/24/1/015024
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Evolution of charged particle densities after laser-induced photodetachment in a strongly electronegative RF discharge”. Yan M, Bogaerts A, Gijbels R, IEEE transactions on plasma science 30, 132 (2002). http://doi.org/10.1109/TPS.2002.1003959
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Exploring alternative metals to Cu and W for interconnects applications using automated first-principles simulations”. Sankaran K, Clima S, Mees M, Pourtois G, ECS journal of solid state science and technology 4, N3127 (2015). http://doi.org/10.1149/2.0181501jss
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Ferroelectric phase transition in the whitlockite-type Ca9Fe(PO4)7, crystal structure of the paraelectric phase at 923 K”. Lazoryak BI, Morozov VA, Belik AA, Stefanovich SY, Grebenev VV, Leonidov IA, Mitberg EB, Davydov SA, Lebedev OI, Van Tendeloo G, Solid state sciences 6, 185 (2004). http://doi.org/10.1016/j.solidstatesciences.2003.12.007
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First-principles electronic functionalization of silicene and germanene by adatom chemisorption”. van den Broek B, Houssa M, Scalise E, Pourtois G, Afanas'ev VV, Stesmans A, Applied surface science 291, 104 (2014). http://doi.org/10.1016/j.apsusc.2013.09.032
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Fluid simulation of the bias effect in inductive/capacitive discharges”. Zhang Y-R, Gao F, Li X-C, Bogaerts A, Wang Y-N, Journal of vacuum science and technology: A: vacuum surfaces and films 33, 061303 (2015). http://doi.org/10.1116/1.4928033
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Formation of diamond nanocrystals in laser-irradiated amorphous carbon films”. Nistor LC, van Landuyt J, Ralchenko VG, Kononenko TV, Obraztsova ED, Strelnitsky VE, International Conference on the New Diamond Science and Technology 4, 25 (1994)
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Formation of Mn304/C core-shell nanowires and a new MN-O phase by electron beam irradiation”. Du GH, Van Tendeloo G, Applied physics A : materials science &, processing 91, 393 (2008). http://doi.org/10.1007/s00339-008-4430-5
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Formation of vortex shells in mesoscopic superconducting squares”. Misko VR, Zhao HJ, Peeters FM, Oboznov V, Dubonos SV, Grigorieva IV, Superconductor science and technology 22, 034001 (2009). http://doi.org/10.1088/0953-2048/22/3/034001
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From olivine to ringwoodite : a TEM study of a complex process”. Pittarello L, Ji G, Yamaguchi A, Schryvers D, Debaille V, Claeys P, Meteoritics and Planetary Science 50, 944 (2015). http://doi.org/10.1111/maps.12441
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Gas purification by nonthermal plasma : a case study of ethylene”. Aerts R, Tu X, Van Gaens W, Whitehead JC, Bogaerts A, Environmental science and technology 47, 6478 (2013). http://doi.org/10.1021/es400405c
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Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 22, 015017 (2013). http://doi.org/10.1088/0963-0252/22/1/015017
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Glycogen as a biodegradable construction nanomaterial for in vivo use”. Filippov SK, Sedlacek O, Bogomolova A, Vetrik M, Jirak D, Kovar J, Kucka J, Bals S, Turner S, Stepanek P, Hruby M;, Macromolecular bioscience 12, 1731 (2012). http://doi.org/10.1002/mabi.201200294
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Grain size tuning of nanocrystalline chemical vapor deposited diamond by continuous electrical bias growth : experimental and theoretical study”. Mortet V, Zhang L, Eckert M, D'Haen J, Soltani A, Moreau M, Troadec D, Neyts E, De Jaeger JC, Verbeeck J, Bogaerts A, Van Tendeloo G, Haenen K, Wagner P, Physica status solidi : A : applications and materials science 209, 1675 (2012). http://doi.org/10.1002/pssa.201200581
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Graphane”. Sahin H, Leenaerts O, Singh SK, Peeters FM, Wiley Interdisciplinary Reviews: Computational Molecular Science 5, 255 (2015). http://doi.org/10.1002/wcms.1216
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Growth of La2Mo2O9 films on porous Al2O3 substrates by radio frequency magnetron sputtering”. Laffez P, Chen XY, Banerjee G, Pezeril T, Rossell MD, Van Tendeloo G, Lacorre P, Liu JM, Liu Z-G, Thin solid films : an international journal on the science and technology of thin and thick films 500, 27 (2006). http://doi.org/10.1016/j.tsf.2005.10.062
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The guidance of vortex-antivortex pairs by in-plane magnetic dipoles in a superconducting finite-size film”. Kapra AV, Misko VR, Vodolazov DY, Peeters FM, Superconductor science and technology 24, 024014 (2011). http://doi.org/10.1088/0953-2048/24/2/024014
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Hardening in relation with microstructure evolution of high purity \alpha-titanium deformed under monotonic and cyclic simple shear loadings at room temperature”. Bouvier S, Benmhenni N, Tirry W, Gregory F, Nixon ME, Cazacu O, Rabet L, Materials science and engineering: part A: structural materials: properties, microstructure and processing 535, 12 (2012). http://doi.org/10.1016/j.msea.2011.12.033
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Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas”. Zhang Q-Z, Liu Y-X, Jiang W, Bogaerts A, Wang Y-N, Plasma sources science and technology 22, 025014 (2013). http://doi.org/10.1088/0963-0252/22/2/025014
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