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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Bogaerts, A.; Gijbels, R. |
Modeling of radio-frequency and direct current glow discharges in argon |
2000 |
Journal of technical physics |
41 |
|
UA library record |
|
|
|
Bogaerts, A. |
The glow discharge: an exciting plasma |
1999 |
Journal of analytical atomic spectrometry |
14 |
29 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. |
Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge |
1999 |
Journal of applied physics |
86 |
18 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge |
1999 |
IEEE transactions on plasma science |
27 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description |
1999 |
Journal of applied physics |
86 |
50 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Effects of adding hydrogen to an argon glow discharge: overview of relevant processes and some qualitative explanations |
2000 |
Journal of analytical atomic spectrometry |
15 |
58 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Description of the argon-excited levels in a radio-frequency and direct current glow discharge |
2000 |
Spectrochimica acta: part B : atomic spectroscopy |
55 |
24 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Behavior of the sputtered copper atoms, ions and excited species in a radio-frequency and direct current glow discharge |
2000 |
Spectrochimica acta: part B : atomic spectroscopy |
55 |
17 |
UA library record; WoS full record; WoS citing articles |
|
|
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Bogaerts, A.; Gijbels, R.; Serikov, V.V. |
Calculation of gas heating in direct current argon glow discharges |
2000 |
Journal of applied physics |
87 |
63 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Oleshko, V.P.; Gijbels, R.H.; van Daele, A.J.; Jacob, W.A. |
On estimation of the dielectric function of Ag(Br,I) nanocrystals by cryo-EELS (addendum) |
1999 |
Nanostructered materials |
11 |
|
UA library record |
|
|
|
de Witte, H.; de Gendt, S.; Douglas, M.; Conard, T.; Kenis, K.; Mertens, P.W.; Vandervorst, W.; Gijbels, R. |
Capabilities of TOF-SIMS to study the influence of different oxidation conditions on metal contamination redistribution |
1999 |
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|
|
UA library record; WoS full record; |
|
|
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van Roy, W.; van Vaeck, L.; Gijbels, R. |
Evaluation of the laser microprobe with time-of-flight mass spectrometer for organic surface and micro-analysis |
1992 |
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|
|
UA library record |
|
|
|
Gijbels, R.; Adriaens, A. |
Einleitung zu den massenspektrometrischen Methoden |
2000 |
|
|
|
UA library record |
|
|
|
Jochum, K.P.; Gijbels, R.; Adriaens, A. |
Multielementmassenspektrometrie (MMS) |
2000 |
|
|
|
UA library record |
|
|
|
Oleshko, V.P.; Gijbels, R.H.; Jacob, W.A. |
Analytical electron microscopy of silver halide photographic systems |
2000 |
Micron |
31 |
8 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Kaganovich, I.; Misina, M.; Berezhnoi, S.; Gijbels, R. |
Electron Boltzmann kinetic equation averaged over fast electron bouncing and pitch-angle scattering for fast modeling of electron cyclotron resonance discharge |
2000 |
Physical review : E : statistical, nonlinear, and soft matter physics |
61 |
31 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Hybrid Monte Carlo-fluid model for a microsecond pulsed glow discharge |
2000 |
Journal of analytical atomic spectrometry |
15 |
23 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
|
|
|
de Witte, H.; Conard, T.; Vandervorst, W.; Gijbels, R. |
SIMS analysis of oxynitrides: evidence for nitrogen diffusion induced by oxygen flooding |
2000 |
Surface and interface analysis |
29 |
4 |
UA library record; WoS full record; WoS citing articles |
|
|
|
de Witte, H.; de Gendt, S.; Douglas, M.; Conard, T.; Kenis, K.; Mertens, P.W.; Vandervorst, W.; Gijbels, R. |
Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on wafer surfaces |
2000 |
Journal of the electrochemical society |
147 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: comparison between Ar and SiH4 |
2000 |
Journal of applied physics |
87 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Charlier, E.; van Doorselaer, M.; Gijbels, R.; de Keyzer, R.; Geuens, I. |
Unveiling the composition of sulphur sensitization specks by their interactions with TAI |
2000 |
Journal Of Imaging Science And Technology |
44 |
16 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Similarities and differences between direct current and radio-frequency glow discharges: a mathematical simulation |
2000 |
Journal of analytical atomic spectrometry |
15 |
25 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Oleshko, V.; Gijbels, R.; Amelinckx, S. |
Electron microscopy and scanning microanalysis |
2000 |
|
|
|
UA library record |
|
|
|
Gijbels, R.; Verlinden, G.; Geuens, I. |
SIMS/TOF-SIMS study of microparticles: surface analysis, imaging and quantification |
2000 |
|
|
|
UA library record; WoS full record; |
|
|
|
de Witte, H.; Conard, T.; Sporken, R.; Gouttebaron, R.; Magnee, R.; Vandervorst, W.; Caudano, R.; Gijbels, R. |
XPS study of ion induced oxidation of silicon with and without oxygen flooding |
2000 |
|
|
|
UA library record |
|
|
|
Lenaerts, J.; Verlinden, G.; van Vaeck, L.; Gijbels, R.; Geuens, I. |
TOF-SIMS analysis of carbocyanine dyes adsorbed on silver substrates |
2000 |
|
|
|
UA library record |
|
|
|
Verlinden, G.; Gijbels, R.; Geuens, I.; de Keyzer, R. |
Chemical surface characterization of complex AgX microcrystals by imaging TOF-SIMS and dual beam depth profiling |
2000 |
|
|
|
UA library record |
|
|
|
de Witte, H.; Conard, T.; Vandervorst, W.; Gijbels, R. |
Study of oxynitrides with dual beam TOF-SIMS |
2000 |
|
|
|
UA library record |
|
|
|
Oleshko, V.P.; Gijbels, R.H.; Bilous, V.M.; Jacob, W.A.; Alfimov, M.V. |
Evolution of impurity clusters and photographic sensitivity |
2000 |
Zhurnal nauchnoj prikladnoj fotografii i kinematografii |
45 |
|
UA library record |
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