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  Author Title Year Publication Volume Times cited Additional Links Links
Verbist, K.; Lebedev, O.I.; Verhoeven, M.A.J.; Winchern, R.; Rijnders, A.J.H.M.; Blank, D.H.A.; Tafuri, F.; Bender, H.; Van Tendeloo, G. Microstructure of YBa2Cu3O7-\delta Josephson junctions in relation to their properties 1998 Superconductor science and technology 11 UA library record; WoS full record; WoS citing articles pdf doi
van Cleempoel, A.; Joutsensaari, J.; Kauppinen, E.; Gijbels, R.; Claeys, M. Aerosol synthesis and characterization of ultrafine fullerene particles 1998 Fullerene science and technology 6 3 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Naylor, J.; Hatcher, M.; Jones, W.J.; Mason, R. Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment 1998 Journal of vacuum science and technology: A: vacuum surfaces and films 16 12 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A. Comprehensive modelling network for dc glow discharges in argon 1999 Plasma sources science and technology 8 27 UA library record; WoS full record; WoS citing articles doi
Conard, T.; de Witte, H.; Loo, R.; Verheyen, P.; Vandervorst, W.; Caymax, M.; Gijbels, R. XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers 1999 Thin solid films : an international journal on the science and technology of thin and thick films 343/344 1 UA library record; WoS full record; WoS citing articles doi
Peeters, F.M.; Devreese, J.T. Hot magneto-phonon and electro-phonon resonances in heterostructures 1992 Semiconductor science and technology: B 7 12 UA library record; WoS full record; WoS citing articles doi
Xu, W.; Peeters, F.M.; Devreese, J.T. Warm-electron transport in a two-dimensional semiconductor 1992 Semiconductor science and technology 7 3 UA library record; WoS full record; WoS citing articles
Huq, M.Z.; Celis, J.P.; Meneve, J.; Stals, L.; Schryvers, D. Oscillating sliding wear of mono- and multilayer ceramic coatings in air 1999 Surface and coatings technology 113 10 UA library record; WoS full record; WoS citing articles doi
Mihailescu, I.N.; Gyorgy, E.; Marin, G.; Popescu, M.; Teodorescu, V.S.; van Landuyt, J.; Grivas, C.; Hatziapostolou, A. Crystalline structure of very hard tungsten carbide thin films obtained by reactive pulsed laser deposition 1999 Journal of vacuum science and technology: A: vacuum surfaces and films 17 8 UA library record; WoS full record; WoS citing articles pdf doi
Kastalsky, A.; Peeters, F.M.; Chan, W.K.; Florez, L.T.; Harbison, J.P. Novel nonlinear transport phenomena in a triangular quantum well 1992 Semiconductor science and technology: B 7 4 UA library record; WoS full record; WoS citing articles doi
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges 2000 Plasma sources science and technology 9 21 UA library record; WoS full record; WoS citing articles doi
Charlier, E.; van Doorselaer, M.; Gijbels, R.; de Keyzer, R.; Geuens, I. Unveiling the composition of sulphur sensitization specks by their interactions with TAI 2000 Journal Of Imaging Science And Technology 44 16 UA library record; WoS full record; WoS citing articles
Badalyan, S.M.; Peeters, F.M. Transport of magnetic edge states in a quantum wire exposed to a non-homogeneous magnetic field 2001 Nanotechnology 12 5 UA library record; WoS full record; WoS citing articles doi
Geuens, I.; Gijbels, R.; Jacob, W.A.; Verbeeck, A.; de Keyzer, R. Analysis of silver halide microcrystals using different modes of a scanning transmission electron microscope and digital image processing 1992 The journal of imaging science and technology 36 10 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Gijbels, R. The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces 2002 Plasma sources science and technology 11 51 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. Numerical modelling of gas discharge plasmas for various applications 2003 Vacuum: surface engineering, surface instrumentation & vacuum technology 69 16 UA library record; WoS full record; WoS citing articles pdf doi
Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. Modeling of the target surface modification by reactive ion implantation during magnetron sputtering 2004 Journal of vacuum science and technology: A: vacuum surfaces and films 22 13 UA library record; WoS full record; WoS citing articles doi
Schryvers, D.; Yandouzi, M.; Toth, L. TEM study of B2 + L12 decomposition in a nanoscale Ni-rich Ni-Al film 1998 Thin solid films : an international journal on the science and technology of thin and thick films 326 1 UA library record; WoS full record; WoS citing articles doi
van Renterghem, W.; Schryvers, D.; van Landuyt, J.; Bollen, D.; van Roost, C.; de Keyzer, R. A TEM study of non-parallel twins inducing thickness growth in silver chloride {111} tabular crystals 2001 The journal of imaging science and technology 45 UA library record; WoS full record; WoS citing articles
van Renterghem, W.; Goessens, C.; Schryvers, D.; van Landuyt, J.; Bollen, D.; de Keyzer, R.; van Roost, C. Influence of twinning on the morphology of AgBr and AgCl microcrystals 2001 The journal of imaging science and technology 45 UA library record; WoS full record; WoS citing articles
Potapov, P.L.; Schryvers, D.; Strijckers, H.; van Roost, C. Microstructural mechanism of development in photothermographic materials 2003 The journal of imaging science and technology 47 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux 2005 Plasma sources science and technology 14 9 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; de Bleecker, K.; Kolev, I.; Madani, M. Modeling of gas discharge plasmas: What can we learn from it? 2005 Surface and coatings technology 200 11 UA library record; WoS full record; WoS citing articles doi
Wu, M.F.; Zhou, S.; Yao, S.; Zhao, Q.; Vantomme, A.; van Daele, B.; Piscopiello, E.; Van Tendeloo, G.; Tong, Y.Z.; Yang, Z.J.; Yu, T.J.; Zhang, G.Y. High precision determination of the elastic strain of InGaN/GaN multiple quantum wells 2004 Journal of vacuum science and technology: B: microelectronics and nanometer structures 22 15 UA library record; WoS full record; WoS citing articles pdf doi
Obradors, X.; Puig, T.; Pomar, A.; Sandiumenge, F.; Piñol, S.; Mestres, N.; Castaño, O.; Coll, M.; Cavallaro, A.; Palau, A.; Gázquez, J.; González, J.C.; Gutiérrez, J.; Romá, N.; Ricart, S.; Moretó, J.M.; Rossell, M.D.; Van Tendeloo, G. Chemical solution deposition: a path towards low cost coated conductors 2004 Superconductor science and technology 17 107 UA library record; WoS full record; WoS citing articles pdf doi
Mahieu, S.; Ghekiere, P.; de Winter, G.; Depla, D.; de Gryse, R.; Lebedev, O.I.; Van Tendeloo, G. Influence of the Ar/O2 ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering 2005 Thin solid films : an international journal on the science and technology of thin and thick films 484 23 UA library record; WoS full record; WoS citing articles pdf doi
Mahieu, S.; Ghekiere, P.; de Winter, G.; de Gryse, R.; Depla, D.; Van Tendeloo, G.; Lebedev, O.I. Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering 2006 Surface and coatings technology 200 36 UA library record; WoS full record; WoS citing articles pdf doi
Tao, X.Y.; Zhang, X.B.; Cheng, J.-P.; Liu, F.; Li, Y.; Van Tendeloo, G. Controllable synthesis of novel one-dimensional carbon nanomaterials on an alkali-element-modified Cu catalyst 2006 Nanotechnology 17 4 UA library record; WoS full record; WoS citing articles pdf doi
Laffez, P.; Chen, X.Y.; Banerjee, G.; Pezeril, T.; Rossell, M.D.; Van Tendeloo, G.; Lacorre, P.; Liu, J.M.; Liu, Z.-G. Growth of La2Mo2O9 films on porous Al2O3 substrates by radio frequency magnetron sputtering 2006 Thin solid films : an international journal on the science and technology of thin and thick films 500 15 UA library record; WoS full record; WoS citing articles pdf doi
Georgieva, V.; Bogaerts, A. Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model 2006 Plasma sources science and technology 15 35 UA library record; WoS full record; WoS citing articles doi
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