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“Microstructure of YBa2Cu3O7-\delta Josephson junctions in relation to their properties”. Verbist K, Lebedev OI, Verhoeven MAJ, Winchern R, Rijnders AJHM, Blank DHA, Tafuri F, Bender H, Van Tendeloo G, Superconductor science and technology 11, 13 (1998). http://doi.org/10.1088/0953-2048/11/1/004
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“Aerosol synthesis and characterization of ultrafine fullerene particles”. van Cleempoel A, Joutsensaari J, Kauppinen E, Gijbels R, Claeys M, Fullerene science and technology 6, 599 (1998). http://doi.org/10.1080/10641229809350223
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“Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment”. Bogaerts A, Naylor J, Hatcher M, Jones WJ, Mason R, Journal of vacuum science and technology: A: vacuum surfaces and films 16, 2400 (1998). http://doi.org/10.1116/1.581359
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“Comprehensive modelling network for dc glow discharges in argon”. Bogaerts A, Plasma sources science and technology 8, 210 (1999). http://doi.org/10.1088/0963-0252/8/2/003
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“XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers”. Conard T, de Witte H, Loo R, Verheyen P, Vandervorst W, Caymax M, Gijbels R, Thin solid films : an international journal on the science and technology of thin and thick films 343/344, 583 (1999). http://doi.org/10.1016/S0040-6090(99)00122-4
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“Hot magneto-phonon and electro-phonon resonances in heterostructures”. Peeters FM, Devreese JT, Semiconductor science and technology: B 7, 15 (1992). http://doi.org/10.1088/0268-1242/7/3B/004
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“Warm-electron transport in a two-dimensional semiconductor”. Xu W, Peeters FM, Devreese JT, Semiconductor science and technology 7, 1251 (1992)
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“Oscillating sliding wear of mono- and multilayer ceramic coatings in air”. Huq MZ, Celis JP, Meneve J, Stals L, Schryvers D, Surface and coatings technology 113, 242 (1999). http://doi.org/10.1016/S0257-8972(99)00009-2
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“Crystalline structure of very hard tungsten carbide thin films obtained by reactive pulsed laser deposition”. Mihailescu IN, Gyorgy E, Marin G, Popescu M, Teodorescu VS, van Landuyt J, Grivas C, Hatziapostolou A, Journal of vacuum science and technology: A: vacuum surfaces and films 17, 249 (1999). http://doi.org/10.1116/1.581579
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“Novel nonlinear transport phenomena in a triangular quantum well”. Kastalsky A, Peeters FM, Chan WK, Florez LT, Harbison JP, Semiconductor science and technology: B 7, 530 (1992). http://doi.org/10.1088/0268-1242/7/3B/138
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“Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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“Unveiling the composition of sulphur sensitization specks by their interactions with TAI”. Charlier E, van Doorselaer M, Gijbels R, de Keyzer R, Geuens I, Journal Of Imaging Science And Technology 44, 235 (2000)
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“Transport of magnetic edge states in a quantum wire exposed to a non-homogeneous magnetic field”. Badalyan SM, Peeters FM, Nanotechnology 12, 570 (2001). http://doi.org/10.1088/0957-4484/12/4/340
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“Analysis of silver halide microcrystals using different modes of a scanning transmission electron microscope and digital image processing”. Geuens I, Gijbels R, Jacob WA, Verbeeck A, de Keyzer R, The journal of imaging science and technology 36, 534 (1992)
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“The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces”. Bogaerts A, Gijbels R, Plasma sources science and technology 11, 27 (2002). http://doi.org/10.1088/0963-0252/11/1/303
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“Numerical modelling of gas discharge plasmas for various applications”. Bogaerts A, Gijbels R, Vacuum: surface engineering, surface instrumentation &, vacuum technology 69, 37 (2003). http://doi.org/10.1016/S0042-207X(02)00306-8
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“Modeling of the target surface modification by reactive ion implantation during magnetron sputtering”. Depla D, Chen ZY, Bogaerts A, Ignatova V, de Gryse R, Gijbels R, Journal of vacuum science and technology: A: vacuum surfaces and films 22, 1524 (2004). http://doi.org/10.1116/1.1705641
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“TEM study of B2 + L12 decomposition in a nanoscale Ni-rich Ni-Al film”. Schryvers D, Yandouzi M, Toth L, Thin solid films : an international journal on the science and technology of thin and thick films 326, 126 (1998). http://doi.org/10.1016/S0040-6090(98)00545-8
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“A TEM study of non-parallel twins inducing thickness growth in silver chloride {111} tabular crystals”. van Renterghem W, Schryvers D, van Landuyt J, Bollen D, van Roost C, de Keyzer R, The journal of imaging science and technology 45, 83 (2001)
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“Influence of twinning on the morphology of AgBr and AgCl microcrystals”. van Renterghem W, Goessens C, Schryvers D, van Landuyt J, Bollen D, de Keyzer R, van Roost C, The journal of imaging science and technology 45, 349 (2001)
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“Microstructural mechanism of development in photothermographic materials”. Potapov PL, Schryvers D, Strijckers H, van Roost C, The journal of imaging science and technology 47, 115 (2003)
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“Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux”. Bogaerts A, Okhrimovskyy A, Baguer N, Gijbels R, Plasma sources science and technology 14, 191 (2005). http://doi.org/10.1088/0963-0252/14/1/021
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“Modeling of gas discharge plasmas: What can we learn from it?”.Bogaerts A, de Bleecker K, Kolev I, Madani M, Surface and coatings technology 200, 62 (2005). http://doi.org/10.1016/j.surfcoat.2005.02.057
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“High precision determination of the elastic strain of InGaN/GaN multiple quantum wells”. Wu MF, Zhou S, Yao S, Zhao Q, Vantomme A, van Daele B, Piscopiello E, Van Tendeloo G, Tong YZ, Yang ZJ, Yu TJ, Zhang GY, Journal of vacuum science and technology: B: microelectronics and nanometer structures 22, 920 (2004). http://doi.org/10.1116/1.1715085
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“Chemical solution deposition: a path towards low cost coated conductors”. Obradors X, Puig T, Pomar A, Sandiumenge F, Piñol S, Mestres N, Castaño O, Coll M, Cavallaro A, Palau A, Gázquez J, González JC, Gutiérrez J, Romá, N, Ricart S, Moretó, JM, Rossell MD, Van Tendeloo G, Superconductor science and technology 17, 1055 (2004). http://doi.org/10.1088/0953-2048/17/8/020
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“Influence of the Ar/O2 ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering”. Mahieu S, Ghekiere P, de Winter G, Depla D, de Gryse R, Lebedev OI, Van Tendeloo G, Thin solid films : an international journal on the science and technology of thin and thick films 484, 18 (2005). http://doi.org/10.1016/j.tsf.2005.01.021
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“Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering”. Mahieu S, Ghekiere P, de Winter G, de Gryse R, Depla D, Van Tendeloo G, Lebedev OI, Surface and coatings technology 200, 2764 (2006). http://doi.org/10.1016/j.surfcoat.2004.09.012
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“Controllable synthesis of novel one-dimensional carbon nanomaterials on an alkali-element-modified Cu catalyst”. Tao XY, Zhang XB, Cheng J-P, Liu F, Li Y, Van Tendeloo G, Nanotechnology 17, 224 (2006). http://doi.org/10.1088/0957-4484/17/1/037
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“Growth of La2Mo2O9 films on porous Al2O3 substrates by radio frequency magnetron sputtering”. Laffez P, Chen XY, Banerjee G, Pezeril T, Rossell MD, Van Tendeloo G, Lacorre P, Liu JM, Liu Z-G, Thin solid films : an international journal on the science and technology of thin and thick films 500, 27 (2006). http://doi.org/10.1016/j.tsf.2005.10.062
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“Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model”. Georgieva V, Bogaerts A, Plasma sources science and technology 15, 368 (2006). http://doi.org/10.1088/0963-0252/15/3/010
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