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| Author | Bogaerts, A.; Gijbels, R. | ||||
| Title | Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model | Type | A1 Journal article | ||
| Year | 1996 | Publication | Journal of applied physics | Abbreviated Journal | J Appl Phys |
| Volume | 79 | Issue | 3 | Pages | 1279-1286 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | |||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | American Institute of Physics | Place of Publication | New York, N.Y. | Editor | |
| Language | Wos | A1996TT92200011 | Publication Date | 2002-07-26 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0021-8979; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 2.183 | Times cited | 81 | Open Access | |
| Notes | Approved | MATERIALS SCIENCE, MULTIDISCIPLINARY 96/271 Q2 # | |||
Call Number  |
UA @ lucian @ c:irua:16239 | Serial | 2920 | ||
| Permanent link to this record | |||||