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Modeling of metastable argon atoms in a direct current glow discharge”. Bogaerts A, Gijbels R, Physical review : A : atomic, molecular and optical physics 52, 3743 (1995). http://doi.org/10.1103/PhysRevA.52.3743
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Modeling of radio-frequency and direct current glow discharges in argon”. Bogaerts A, Gijbels R, Journal of technical physics 41, 183 (2000)
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Modelling of a direct current glow discharge: combined models for the electrons, argon ions and metastables”. Bogaerts A, Gijbels R, , 292 (1995)
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Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge”. Bogaerts A, Gijbels R, IEEE transactions on plasma science 27, 1406 (1999). http://doi.org/10.1109/27.799819
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New developments and applications in GDMS”. Bogaerts A, Gijbels R, Fresenius' journal of analytical chemistry 364, 367 (1999). http://doi.org/10.1007/s002160051352
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Numerical modelling of analytical glow discharges”. Bogaerts A, Gijbels R Wiley, Chichester, page 155 (2003).
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Numerical modelling of gas discharge plasmas for various applications”. Bogaerts A, Gijbels R, Vacuum: surface engineering, surface instrumentation &, vacuum technology 69, 37 (2003). http://doi.org/10.1016/S0042-207X(02)00306-8
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Plasma models”. Bogaerts A, Gijbels R Wiley, New York, page 176 (1997).
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Relative sensitivity factors in glow discharge mass spectrometry: the role of charge transfer ionization”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 11, 841 (1996). http://doi.org/10.1039/ja9961100841
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The role of fast argon ions and atoms in the ionization of argon in a direct current glow discharge: a mathematical simulation”. Bogaerts A, Gijbels R, Journal of applied physics 78, 6427 (1995). http://doi.org/10.1063/1.360526
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Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model”. Bogaerts A, Gijbels R, Journal of applied physics 79, 1279 (1996). http://doi.org/10.1063/1.361023
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Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description”. Bogaerts A, Gijbels R, Journal of applied physics 86, 4124 (1999). http://doi.org/10.1063/1.371337
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Similarities and differences between direct current and radio-frequency glow discharges: a mathematical simulation”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 15, 1191 (2000). http://doi.org/10.1039/b000519n
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Three-dimensional modeling of a direct current glow discharge in argon: is it better than one-dimensional modeling?”.Bogaerts A, Gijbels R, Fresenius' journal of analytical chemistry 359, 331 (1997). http://doi.org/10.1007/s002160050582
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Two-dimensional model of a direct current glow discharge : description of the argon metastable atoms, sputtered atoms and ions”. Bogaerts A, Gijbels R, Analytical chemistry 68, 2676 (1996). http://doi.org/10.1021/ac951206z
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Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials”. Bogaerts A, Eckert M, Mao M, Neyts E, Journal of physics: D: applied physics 44, 174030 (2011). http://doi.org/10.1088/0022-3727/44/17/174030
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Comparison of calculated and measured optical emission intensities in a direct current argon-copper glow discharge”. Bogaerts A, Donko Z, Kutasi K, Bano G, Pinhao N, Pinheiro M, Spectrochimica acta: part B : atomic spectroscopy 55, 1465 (2000). http://doi.org/10.1016/S0584-8547(00)00253-6
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Modeling of gas discharge plasmas: What can we learn from it?”.Bogaerts A, de Bleecker K, Kolev I, Madani M, Surface and coatings technology 200, 62 (2005). http://doi.org/10.1016/j.surfcoat.2005.02.057
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Computer simulations for processing plasmas”. Bogaerts A, de Bleecker K, Georgieva V, Kolev I, Madani M, Neyts E, Plasma processes and polymers 3, 110 (2006). http://doi.org/10.1002/ppap.200500065
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Numerical modeling for a better understanding of gas discharge plasmas”. Bogaerts A, de Bleecker K, Georgieva V, Herrebout D, Kolev I, Madani M, Neyts E, High temperature material processes 9, 321 (2005). http://doi.org/10.1615/HighTempMatProc.v9.i3.10
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Plasma based CO2and CH4conversion: A modeling perspective”. Bogaerts A, De Bie C, Snoeckx R, Koz?k T, Plasma processes and polymers 14, 1600070 (2017). http://doi.org/10.1002/ppap.201600070
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Modeling of the plasma chemistry and plasmasurface interactions in reactive plasmas”. Bogaerts A, De Bie C, Eckert M, Georgieva V, Martens T, Neyts E, Tinck S, Pure and applied chemistry 82, 1283 (2010). http://doi.org/10.1351/PAC-CON-09-09-20
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Laser ablation for analytical sampling: what can we learn from modeling?”.Bogaerts A, Chen Z, Gijbels R, Vertes A, Spectrochimica acta: part B : atomic spectroscopy 58, 1867 (2003). http://doi.org/10.1016/j.sab.2003.08.004
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Glow discharge modelling: from basic understanding towards applications”. Bogaerts A, Chen Z, Gijbels R, Surface and interface analysis 35, 593 (2003). http://doi.org/10.1002/sia.1578
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Laser ablation of copper in different background gases: comparative study by numerical modeling and experiments”. Bogaerts A, Chen Z, Bleiner D, Journal of analytical atomic spectrometry 21, 384 (2006). http://doi.org/10.1039/b514313f
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Double pulse laser ablation and laser induced breakdown spectroscopy: a modeling investigation”. Bogaerts A, Chen Z, Autrique D, Spectrochimica acta: part B : atomic spectroscopy 63, 746 (2008). http://doi.org/10.1016/j.sab.2008.04.005
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Effect of laser parameters on laser ablation and laser-induced plasma formation: a numerical modeling investigation”. Bogaerts A, Chen Z, Spectrochimica acta: part B : atomic spectroscopy 60, 1280 (2005). http://doi.org/10.1016/j.sab.2005.06.009
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Nanosecond laser ablation of Cu: modeling of the expansion in He background gas, and comparison with expansion in vacuum”. Bogaerts A, Chen Z, Journal of analytical atomic spectrometry 19, 1169 (2004). http://doi.org/10.1039/b402946a
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Challenges in unconventional catalysis”. Bogaerts A, Centi G, Hessel V, Rebrov E, Catalysis today 420, 114180 (2023). http://doi.org/10.1016/j.cattod.2023.114180
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Plasma Technology for CO2 Conversion: A Personal Perspective on Prospects and Gaps”. Bogaerts A, Centi G, Frontiers in energy research 8 (2020). http://doi.org/10.3389/fenrg.2020.00111
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