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Comparison of modeling calculations with experimental results for rf glow discharge optical emission spectrometry”. Bogaerts A, Wilken L, Hoffmann V, Gijbels R, Wetzig K, Spectrochimica acta: part B : atomic spectroscopy 57, 109 (2002). http://doi.org/10.1016/S0584-8547(01)00357-3
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Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge”. Bogaerts A, Yan M, Gijbels R, Goedheer W, Journal of applied physics 86, 2990 (1999). http://doi.org/10.1063/1.371159
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Ab initio study of the X2\Sigma+ and A 2\Pi states of the SiN radical”. Cai ZL, Martin JML, François JP, Gijbels R, Chemical physics letters 252, 398 (1996). http://doi.org/10.1016/0009-2614(96)00183-2
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Comment on 'Integral cross sections for electron impact excitation of electronic states of N2'”. Cenian A, Chernukho A, Bogaerts A, Gijbels R, Journal of physics: B : atomic and molecular physics 35, 5163 (2002). http://doi.org/10.1088/0953-4075/35/24/401
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Langmuir probe diagnostic of high pressure plasmas: study by PIC-MC modelling”. Cenian A, Chernukho A, Bogaerts A, Gijbels R, Leys C, , 61 (2004)
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Particle-in-cell Monte Carlo modeling of Langmuir probes in an Ar plasma”. Cenian A, Chernukho A, Bogaerts A, Gijbels R, Leys C, Journal of applied physics 97, 123310 (2005). http://doi.org/10.1063/1.1938275
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Determination of the silver sulphide cluster size distribution via computer simulations”. Charlier E, Gijbels R, Van Doorselaer M, De Keyzer R page 85 (2000).
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Functioning of thiocyanate ions during sulphur and sulphur-plus-gold Sensitization”. Charlier E, Gijbels R, Van Doorselaer M, De Keyzer R, , 172 (2000)
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Unveiling the composition of sulphur sensitization specks by their interactions with TAI”. Charlier E, van Doorselaer M, Gijbels R, de Keyzer R, Geuens I, Journal Of Imaging Science And Technology 44, 235 (2000)
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Gold mobility in waters from temperate regions”. Cidu R, Fanfani L, Shand P, Edmunds WM, Van 't dack L, Gijbels R, (1995)
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Hydrogeochemical exploration for gold in the Osilo area, Sardinia, Italy”. Cidu R, Fanfani L, Shand P, Edmunds WM, Van 't dack L, Gijbels R, Applied geochemistry 10, 517 (1995). http://doi.org/10.1016/0883-2927(95)00022-4
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Determination of gold at the ultratrace level in natural waters”. Cidu R, Fanfani L, Shaud P, Edmunds WM, Van 't dack L, Gijbels R, Analytica chimica acta 296, 295 (1994). http://doi.org/10.1016/0003-2670(94)80249-1
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Laser microprobe mass spectrometry of quaternary phosphonium salts: direct versus matrix-assisted laser desorption”. Claereboudt J, Claeys M, Geise H, Gijbels R, Vertes A, Journal of the American Society for Mass Spectrometry 4, 798 (1993). http://doi.org/10.1016/1044-0305(93)80038-Z
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XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers”. Conard T, de Witte H, Loo R, Verheyen P, Vandervorst W, Caymax M, Gijbels R, Thin solid films : an international journal on the science and technology of thin and thick films 343/344, 583 (1999). http://doi.org/10.1016/S0040-6090(99)00122-4
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Numerical investigation of particle formation mechanisms in silane discharges”. de Bleecker K, Bogaerts A, Gijbels R, Goedheer W, Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics 69, 056409 (2004). http://doi.org/10.1103/PhysRevE.69.056409
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Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model”. de Bleecker K, Bogaerts A, Goedheer W, Gijbels R, IEEE transactions on plasma science 32, 691 (2004). http://doi.org/10.1109/TPS.2004.826095
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Modelling of formation and transport of nanoparticles in silane discharges”. de Bleecker K, Bogaerts A, Goedheer WJ, Gijbels R, , 0 (2004)
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One-dimensional modelling of a capacitively coupled rf plasma in silane/helium, including small concentrations of O2 and N2”. de Bleecker K, Herrebout D, Bogaerts A, Gijbels R, Descamps P, Journal of physics: D: applied physics 36, 1826 (2003)
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Empirical evaluation of metal deposition for the analysis of organic compounds with static secondary ion mass spectrometry (S-SIMS)”. de Mondt R, Adriaensen L, Vangaever F, Lenaerts J, van Vaeck L, Gijbels R, Applied surface science 252, 6652 (2006). http://doi.org/10.1016/j.apsusc.2006.02.110
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Characterization of AgxAuy nano particles by TEM and STEM”. de Vyt A, Gijbels R, Davock H, van Roost C, Geuens I, Journal of analytical atomic spectrometry 14, 499 (1999). http://doi.org/10.1039/a807695b
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Quantitative analysis of individual AgxAuy nanoparticles by TEM-EDX: track 1”. de Vyt A, Gijbels R, van Roost C, Geuens I, , 524 (1998)
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XPS study of ion induced oxidation of silicon with and without oxygen flooding”. de Witte H, Conard T, Sporken R, Gouttebaron R, Magnee R, Vandervorst W, Caudano R, Gijbels R, , 73 (2000)
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Ion-bombardment artifact in TOF-SIMS analysis of ZrO2/SiO2/Si stacks”. de Witte H, Conard T, Vandervorst W, Gijbels R, Applied surface science 203, 523 (2003). http://doi.org/10.1016/S0169-4332(02)00728-6
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SIMS analysis of oxynitrides: evidence for nitrogen diffusion induced by oxygen flooding”. de Witte H, Conard T, Vandervorst W, Gijbels R, Surface and interface analysis 29, 761 (2000). http://doi.org/10.1002/1096-9918(200011)29:11<761::AID-SIA926>3.0.CO;2-F
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Study of oxynitrides with dual beam TOF-SIMS”. de Witte H, Conard T, Vandervorst W, Gijbels R, , 611 (2000)
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Capabilities of TOF-SIMS to study the influence of different oxidation conditions on metal contamination redistribution”. de Witte H, de Gendt S, Douglas M, Conard T, Kenis K, Mertens PW, Vandervorst W, Gijbels R s.n., Leuven, page 147 (1999).
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Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on wafer surfaces”. de Witte H, de Gendt S, Douglas M, Conard T, Kenis K, Mertens PW, Vandervorst W, Gijbels R, Journal of the electrochemical society 147, 13 (2000). http://doi.org/10.1149/1.1393457
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Modeling of bombardment induced oxidation of silicon”. de Witte H, Vandervorst W, Gijbels R, Journal of applied physics 89, 3001 (2001). http://doi.org/10.1063/1.1344581
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Modeling of bombardment induced oxidation of silicon with and without oxygen flooding”. de Witte H, Vandervorst W, Gijbels R, , 327 (1998)
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Modeling of the target surface modification by reactive ion implantation during magnetron sputtering”. Depla D, Chen ZY, Bogaerts A, Ignatova V, de Gryse R, Gijbels R, Journal of vacuum science and technology: A: vacuum surfaces and films 22, 1524 (2004). http://doi.org/10.1116/1.1705641
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