Author  |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| Ghica, C.; Nistor, L.C.; Bender, H.; Richard, O.; Van Tendeloo, G.; Ulyashin, A. |
TEM characterization of extended defects induced in Si wafers by H-plasma treatment |
2007 |
Journal of physics: D: applied physics |
40 |
10 |
UA library record; WoS full record; WoS citing articles |
| Ghica, C.; Nistor, L.; Bender, H.; Steegen, A.; Lauwers, A.; Maex, K.; van Landuyt, J. |
In situ transmission electron microscopy study of the silicidation process in Co thin films on patterned (001) Si substrates |
2001 |
Journal of materials research |
16 |
4 |
UA library record; WoS full record; WoS citing articles |
| Heyne, M.H.; Chiappe, D.; Meersschaut, J.; Nuytten, T.; Conard, T.; Bender, H.; Huyghebaert, C.; Radu, I.P.; Caymax, M.; de Marneffe, J.F.; Neyts, E.C.; De Gendt, S.; |
Multilayer MoS2 growth by metal and metal oxide sulfurization |
2016 |
Journal of materials chemistry C : materials for optical and electronic devices |
4 |
|
UA library record; WoS full record; WoS citing articles |
| Ghica, C.; Nistor, L.C.; Bender, H.; Richard, O.; Van Tendeloo, G.; Ulyashin, A.; |
Characterization of {111} planar defects induced in silicon by hydrogen plasma treatments |
2006 |
Philosophical magazine |
86 |
12 |
UA library record; WoS full record; WoS citing articles |
