Number of records found: 335
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Citations
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Comparison of modeling calculations with experimental results for rf glow discharge optical emission spectrometry”. Bogaerts A, Wilken L, Hoffmann V, Gijbels R, Wetzig K, Spectrochimica acta: part B : atomic spectroscopy 57, 109 (2002). http://doi.org/10.1016/S0584-8547(01)00357-3
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Gas discharge plasmas and their applications”. Bogaerts A, Neyts E, Gijbels R, van der Mullen J, Spectrochimica acta: part B : atomic spectroscopy 57, 609 (2002). http://doi.org/10.1016/S0584-8547(01)00406-2
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Hybrid model for a cylindrical hollow cathode glow discharge and comparison with experiments”. Baguer N, Bogaerts A, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 57, 311 (2002). http://doi.org/10.1016/S0584-8547(01)00385-8
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Hybrid Monte-Carlo-fluid modeling network for an argon/hydrogen direct current glow discharge”. Bogaerts A, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 57, 1071 (2002). http://doi.org/10.1016/S0584-8547(02)00047-2
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Laser ablation for analytical sampling: what can we learn from modeling?”.Bogaerts A, Chen Z, Gijbels R, Vertes A, Spectrochimica acta: part B : atomic spectroscopy 58, 1867 (2003). http://doi.org/10.1016/j.sab.2003.08.004
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Fundamental studies on a planar-cathode direct current glow discharge: part 2: numerical modeling and comparison with laser scattering experiments”. Bogaerts A, Gijbels R, Gamez G, Hieftje GM, Spectrochimica acta: part B : atomic spectroscopy 59, 449 (2004). http://doi.org/10.1016/j.sab.2003.12.001
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Calculation of rate constants for asymmetric charge transfer, and their effect on relative sensitivity factors in glow discharge mass spectrometry”. Bogaerts A, Temelkov KA, Vuchkov NK, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 62, 325 (2007). http://doi.org/10.1016/j.sab.2007.03.010
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Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on wafer surfaces”. de Witte H, de Gendt S, Douglas M, Conard T, Kenis K, Mertens PW, Vandervorst W, Gijbels R, Journal of the electrochemical society 147, 13 (2000). http://doi.org/10.1149/1.1393457
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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces”. Bogaerts A, Gijbels R, Plasma sources science and technology 11, 27 (2002). http://doi.org/10.1088/0963-0252/11/1/303
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Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux”. Bogaerts A, Okhrimovskyy A, Baguer N, Gijbels R, Plasma sources science and technology 14, 191 (2005). http://doi.org/10.1088/0963-0252/14/1/021
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Computer simulation of an analytical direct current glow discharge in argon: influence of the cell dimensions on the plasma quantities”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 12, 751 (1997)
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Argon and copper optical emission spectra in a Grimm glow discharge source: mathematical simulations and comparison with experiment”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 13, 721 (1998). http://doi.org/10.1039/a802894j
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Modeling of argon direct current glow discharges and comparison with experiment: how good is the agreement?”.Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 13, 945 (1998). http://doi.org/10.1039/a800329g
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Characterization of AgxAuy nano particles by TEM and STEM”. de Vyt A, Gijbels R, Davock H, van Roost C, Geuens I, Journal of analytical atomic spectrometry 14, 499 (1999). http://doi.org/10.1039/a807695b
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Surface analysis of halide distributions in complex AgX microcrystals by imaging time-of-flight SIMS (TOF-SIMS)”. Verlinden G, Gijbels R, Geuens I, de Keyzer R, Journal of analytical atomic spectrometry 14, 429 (1999). http://doi.org/10.1039/a807276k
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Effects of adding hydrogen to an argon glow discharge: overview of relevant processes and some qualitative explanations”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 15, 441 (2000). http://doi.org/10.1039/a909779a
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Hybrid Monte Carlo-fluid model for a microsecond pulsed glow discharge”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 15, 895 (2000). http://doi.org/10.1039/b003398g
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Similarities and differences between direct current and radio-frequency glow discharges: a mathematical simulation”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 15, 1191 (2000). http://doi.org/10.1039/b000519n
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Improved hybrid Monte Carlo-fluid model for the electrical characteristics in an analytical radiofrequency glow discharge in argon”. Bogaerts A, Gijbels R, Goedheer W, Journal of analytical atomic spectrometry 16, 750 (2001). http://doi.org/10.1039/b103768b
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Modeling of a microsecond pulsed glow discharge: behavior of the argon excited levels and of the sputtered copper atoms and ions”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 16, 239 (2001). http://doi.org/10.1039/b009289o
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Calculation of the gas flow and its effect on the plasma characteristics for a modified Grimm-type glow discharge cell”. Bogaerts A, Okhrimovskyy A, Gijbels R, Journal of analytical atomic spectrometry 17, 1076 (2002). http://doi.org/10.1039/b200746k
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Modeling of a millisecond pulsed glow discharge: investigation of the afterpeak”. Bogaerts A, Gijbels R, Jackson GP, Journal of analytical atomic spectrometry 18, 533 (2003). http://doi.org/10.1039/b212606k
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Calculation of cathode heating in analytical glow discharges”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 19, 1206 (2004). http://doi.org/10.1039/b400483c
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Imaging TOF-SIMS for the surface analysis of silver halide microcrystals”. Lenaerts J, Gijbels R, van Vaeck L, Verlinden G, Geuens I, Applied surface science 203/204, 614 (2003). http://doi.org/10.1016/S0169-4332(02)00777-8
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Ion-bombardment artifact in TOF-SIMS analysis of ZrO2/SiO2/Si stacks”. de Witte H, Conard T, Vandervorst W, Gijbels R, Applied surface science 203, 523 (2003). http://doi.org/10.1016/S0169-4332(02)00728-6
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A comparative study of carbocyanine dyes measured with TOF-SIMS and other mass spectrometric techniques”. Adriaensen L, Vangaever F, Gijbels R, Applied surface science 231/232, 348 (2004). http://doi.org/10.1016/j.apsusc.2004.03.091
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Depth profiling of ZrO2/SiO2/Si stacks : a TOF-SIMS and computer simulation study”. Ignatova VA, Conard T, Möller W, Vandervorst W, Gijbels R, Applied surface science 231/232, 603 (2004). http://doi.org/10.1016/j.apsusc.2004.03.121
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Organic SIMS: the influence of time on the ion yield enhancement by silver and gold deposition”. Adriaensen L, Vangaever F, Gijbels R, Applied surface science 231/232, 256 (2004). http://doi.org/10.1016/j.apsusc.2004.03.031
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Empirical evaluation of metal deposition for the analysis of organic compounds with static secondary ion mass spectrometry (S-SIMS)”. de Mondt R, Adriaensen L, Vangaever F, Lenaerts J, van Vaeck L, Gijbels R, Applied surface science 252, 6652 (2006). http://doi.org/10.1016/j.apsusc.2006.02.110
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