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  Author Title Year Publication Volume Times cited Additional Links Links
Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. Fluid modelling of an atmospheric pressure dielectric barrier discharge in cylindrical geometry 2009 Journal of physics: D: applied physics 42 29 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Bogaerts, A. Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry 2016 Journal of physics: D: applied physics 49 5 UA library record; WoS full record; WoS citing articles pdf url doi
Tinck, S.; Tillocher, T.; Dussart, R.; Bogaerts, A. Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study 2015 Journal of physics: D: applied physics 48 9 UA library record; WoS full record; WoS citing articles pdf url doi
Mao, M.; Wang, Y.N.; Bogaerts, A. Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications 2011 Journal of physics: D: applied physics 44 20 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Boullart, W.; Bogaerts, A. Simulation of an Ar/Cl2 inductively coupled plasma: study of the effect of bias, power and pressure and comparison with experiments 2008 Journal of physics: D: applied physics 41 31 UA library record; WoS full record; WoS citing articles doi
Mao, M.; Bogaerts, A. Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma enhanced CVD system : the effect of different gas mixtures 2010 Journal of physics: D: applied physics 43 52 UA library record; WoS full record; WoS citing articles doi
Gröger, S.; Ramakers, M.; Hamme, M.; Medrano, J.A.; Bibinov, N.; Gallucci, F.; Bogaerts, A.; Awakowicz, P. Characterization of a nitrogen gliding arc plasmatron using optical emission spectroscopy and high-speed camera 2019 Journal of physics: D: applied physics 52 7 UA library record; WoS full record; WoS citing articles pdf url doi
Bultinck, E.; Bogaerts, A. The effect of the magnetic field strength on the sheath region of a dc magnetron discharge 2008 Journal of physics: D: applied physics 41 16 UA library record; WoS full record; WoS citing articles doi
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. The origin of Bohm diffusion, investigated by a comparison of different modelling methods 2010 Journal of physics: D: applied physics 43 16 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Khosravian, N.; Van der Paal, J.; Verlackt, C.C.W.; Yusupov, M.; Kamaraj, B.; Neyts, E.C. Multi-level molecular modelling for plasma medicine 2016 Journal Of Physics D-Applied Physics 49 UA library record pdf url
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. Densification of thin a-C: H films grown from low-kinetic energy hydrocarbon radicals under the influence of H and C particle fluxes: a molecular dynamics study 2006 Journal of physics: D: applied physics 39 3 UA library record; WoS full record; WoS citing articles doi
Felten, A.; Ghijsen, J.; Pireaux, J.-J.; Johnson, R.L.; Whelan, C.M.; Liang, D.; Van Tendeloo, G. Effect of oxygen rf-plasma on electronic properties of CNTs 2007 Journal of physics: D: applied physics 40 25 UA library record; WoS full record; WoS citing articles doi
Eckert, M.; Neyts, E.; Bogaerts, A. On the reaction behaviour of hydrocarbon species at diamond (1 0 0) and (1 1 1) surfaces: a molecular dynamics investigation 2008 Journal of physics: D: applied physics 41 17 UA library record; WoS full record; WoS citing articles doi
de Bleecker, K.; Herrebout, D.; Bogaerts, A.; Gijbels, R.; Descamps, P. One-dimensional modelling of a capacitively coupled rf plasma in silane/helium, including small concentrations of O2 and N2 2003 Journal of physics: D: applied physics 36 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Neyts, E.C.; Rousseau, A. Special issue on fundamentals of plasmasurface interactions 2014 Journal of physics: D: applied physics 47 2 UA library record; WoS full record; WoS citing articles doi
Ghica, C.; Nistor, L.C.; Bender, H.; Richard, O.; Van Tendeloo, G.; Ulyashin, A. TEM characterization of extended defects induced in Si wafers by H-plasma treatment 2007 Journal of physics: D: applied physics 40 10 UA library record; WoS full record; WoS citing articles pdf doi
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