Number of records found: 1297
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Citations
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Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment”. Bogaerts A, Naylor J, Hatcher M, Jones WJ, Mason R, Journal of vacuum science and technology: A: vacuum surfaces and films 16, 2400 (1998). http://doi.org/10.1116/1.581359
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Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime”. Zhang Y-R, Tinck S, De Schepper P, Wang Y-N, Bogaerts A, Journal of vacuum science and technology: A: vacuum surfaces and films 33, 021310 (2015). http://doi.org/10.1116/1.4906819
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Modeling of the target surface modification by reactive ion implantation during magnetron sputtering”. Depla D, Chen ZY, Bogaerts A, Ignatova V, de Gryse R, Gijbels R, Journal of vacuum science and technology: A: vacuum surfaces and films 22, 1524 (2004). http://doi.org/10.1116/1.1705641
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Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates”. Delabie A, Sioncke S, Rip J, Van Elshocht S, Pourtois G, Mueller M, Beckhoff B, Pierloot K, Journal of vacuum science and technology: A: vacuum surfaces and films 30, 01a127 (2012). http://doi.org/10.1116/1.3664090
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Thermal recrystallization of short-range ordered WS2 films”. Heyne MH, de Marneffe J-F, Radu I, Neyts EC, De Gendt S, Journal of vacuum science and technology: A: vacuum surfaces and films 36, 05g501 (2018). http://doi.org/10.1116/1.5036654
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The effect of hydrogen on the electronic and bonding properties of amorphous carbon”. Titantah JT, Lamoen D, Neyts E, Bogaerts A, Journal of physics : condensed matter 18, 10803 (2006). http://doi.org/10.1088/0953-8984/18/48/007
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Perovskite transparent conducting oxides : an ab initio study”. Dabaghmanesh S, Saniz R, Amini MN, Lamoen D, Partoens B, Journal of physics : condensed matter 25, 415503 (2013). http://doi.org/10.1088/0953-8984/25/41/415503
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Origin of the apparent delocalization of the conduction band in a high-mobility amorphous semiconductor”. de de Meux AJ, Pourtois G, Genoe J, Heremans P, Journal of physics : condensed matter 29, 255702 (2017). http://doi.org/10.1088/1361-648X/AA608C
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Computer modelling of magnetron discharges”. Bogaerts A, Bultinck E, Kolev I, Schwaederlé, L, van Aeken K, Buyle G, Depla D, Journal of physics: D: applied physics 42, 194018 (2009). http://doi.org/10.1088/0022-3727/42/19/194018
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Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials”. Bogaerts A, Eckert M, Mao M, Neyts E, Journal of physics: D: applied physics 44, 174030 (2011). http://doi.org/10.1088/0022-3727/44/17/174030
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Computer simulations of plasmabiomolecule and plasmatissue interactions for a better insight in plasma medicine”. Neyts EC, Yusupov M, Verlackt CC, Bogaerts A, Journal of physics: D: applied physics 47, 293001 (2014). http://doi.org/10.1088/0022-3727/47/29/293001
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Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study”. Tinck S, Tillocher T, Dussart R, Bogaerts A, Journal of physics: D: applied physics 48, 155204 (2015). http://doi.org/10.1088/0022-3727/48/15/155204
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Densification of thin a-C: H films grown from low-kinetic energy hydrocarbon radicals under the influence of H and C particle fluxes: a molecular dynamics study”. Neyts E, Bogaerts A, van de Sanden MCM, Journal of physics: D: applied physics 39, 1948 (2006). http://doi.org/10.1088/0022-3727/39/9/034
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The effect of the magnetic field strength on the sheath region of a dc magnetron discharge”. Bultinck E, Bogaerts A, Journal of physics: D: applied physics 41, 202007 (2008). http://doi.org/10.1088/0022-3727/41/20/202007
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Fluid modelling of an atmospheric pressure dielectric barrier discharge in cylindrical geometry”. Petrović, D, Martens T, van Dijk J, Brok WJM, Bogaerts A, Journal of physics: D: applied physics 42, 205206 (2009). http://doi.org/10.1088/0022-3727/42/20/205206
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Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 1 : transient behaviour of electrodynamics and power deposition”. Zhang Y-R, Xu X, Bogaerts A, Wang Y-N, Journal of physics: D: applied physics 45, 015202 (2012). http://doi.org/10.1088/0022-3727/45/1/015202
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Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 2 : radial uniformity of the plasma characteristics”. Zhang Y-R, Xu X, Bogaerts A, Wang Y-N, Journal of physics: D: applied physics 45, 015203 (2012). http://doi.org/10.1088/0022-3727/45/1/015203
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Fluid simulation of the phase-shift effect in Ar/CF4 capacitively coupled plasmas”. Zhang Y-R, Bogaerts A, Wang Y-N, Journal of physics: D: applied physics 45, 485204 (2012). http://doi.org/10.1088/0022-3727/45/48/485204
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Interaction of O and OH radicals with a simple model system for lipids in the skin barrier : a reactive molecular dynamics investigation for plasma medicine”. Van der Paal J, Aernouts S, van Duin ACT, Neyts EC, Bogaerts A, Journal of physics: D: applied physics 46, 395201 (2013). http://doi.org/10.1088/0022-3727/46/39/395201
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Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma enhanced CVD system : the effect of different gas mixtures”. Mao M, Bogaerts A, Journal of physics: D: applied physics 43, 205201 (2010). http://doi.org/10.1088/0022-3727/43/20/205201
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Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma-enhanced CVD system : the effect of processing parameters”. Mao M, Bogaerts A, Journal of physics: D: applied physics 43, 315203 (2010). http://doi.org/10.1088/0022-3727/43/31/315203
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Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments”. Tinck S, Boullart W, Bogaerts A, Journal of physics: D: applied physics 42, 095204 (2009). http://doi.org/10.1088/0022-3727/42/9/095204
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Kinetic modelling for an atmospheric pressure argon plasma jet in humid air”. Van Gaens W, Bogaerts A, Journal of physics: D: applied physics 46, 275201 (2013). http://doi.org/10.1088/0022-3727/46/27/275201
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Kinetic simulation of direct-current driven microdischarges in argon at atmospheric pressure”. Zhang Y, Jiang W, Bogaerts A, Journal of physics: D: applied physics 47, 435201 (2014). http://doi.org/10.1088/0022-3727/47/43/435201
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New pathways for nanoparticle formation in acetylene dusty plasmas: a modelling investigation and comparison with experiments”. Mao M, Benedikt J, Consoli A, Bogaerts A, Journal of physics: D: applied physics 41 (2008). http://doi.org/10.1088/0022-3727/41/22/225201
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Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching”. Gul B, Tinck S, De Schepper P, Aman-ur-Rehman, Bogaerts A, Journal of physics: D: applied physics 48, 025202 (2015). http://doi.org/10.1088/0022-3727/48/2/025202
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Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications”. Mao M, Wang YN, Bogaerts A, Journal of physics: D: applied physics 44, 435202 (2011). http://doi.org/10.1088/0022-3727/44/43/435202
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On the reaction behaviour of hydrocarbon species at diamond (1 0 0) and (1 1 1) surfaces: a molecular dynamics investigation”. Eckert M, Neyts E, Bogaerts A, Journal of physics: D: applied physics 41, 032006 (2008). http://doi.org/10.1088/0022-3727/41/3/032006
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On the regime transitions during the formation of an atmospheric pressure dielectric barrier glow discharge”. Martens T, Brok WJM, van Dijk J, Bogaerts A, Journal of physics: D: applied physics 42, 122002 (2009). http://doi.org/10.1088/0022-3727/42/12/122002
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One-dimensional modelling of a capacitively coupled rf plasma in silane/helium, including small concentrations of O2 and N2”. de Bleecker K, Herrebout D, Bogaerts A, Gijbels R, Descamps P, Journal of physics: D: applied physics 36, 1826 (2003)
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