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Author | Georgieva, V.; Bogaerts, A. | ||||
Title | Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics | Type | A1 Journal article | ||
Year | 2005 | Publication | Journal of applied physics | Abbreviated Journal | J Appl Phys |
Volume | 98 | Issue | 2 | Pages | 023308,1-13 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | |||||
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Corporate Author | Thesis | ||||
Publisher | American Institute of Physics | Place of Publication | New York, N.Y. | Editor | |
Language | Wos | 000230931500016 | Publication Date | 2005-07-27 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0021-8979; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 2.068 | Times cited | 75 | Open Access | |
Notes | Approved | Most recent IF: 2.068; 2005 IF: 2.498 | |||
Call Number | UA @ lucian @ c:irua:53575 | Serial | 2404 | ||
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