| Poulain, R.; Lumbeeck, G.; Hunka, J.; Proost, J.; Savolainen, H.; Idrissi, H.; Schryvers, D.; Gauquelin, N.; Klein, A. |
Electronic and chemical properties of nickel oxide thin films and the intrinsic defects compensation mechanism |
2022 |
ACS applied electronic materials |
4 |
|
UA library record; WoS full record; WoS citing articles |
