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Title
Year
Publication
Volume
Times cited
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Van Laer, K.
;
Tinck, S.
;
Samara, V.
;
de Marneffe, J.F.
;
Bogaerts, A.
Etching of low-k materials for microelectronics applications by means of a N
2
/H
2
plasma : modeling and experimental investigation
2013
Plasma sources science and technology
22
13
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;
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;
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