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Author Title Year (down) Publication Volume Times cited Additional Links
Grieb, T.; Tewes, M.; Schowalter, M.; Müller-Caspary, K.; Krause, F.F.; Mehrtens, T.; Hartmann, J.-M.; Rosenauer, A. Quantitative HAADF STEM of SiGe in presence of amorphous surface layers from FIB preparation 2018 Ultramicroscopy 184 7 UA library record; WoS full record; WoS citing articles
Cooper, D.; Denneulin, T.; Barnes, J.-P.; Hartmann, J.-M.; Hutin, L.; Le Royer, C.; Béché, A.; Rouvière, J.-L. Strain mapping with nm-scale resolution for the silicon-on-insulator generation of semiconductor devices by advanced electron microscopy 2012 Applied Physics Letters 112 14 UA library record; WoS full record; WoS citing articles