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  Author Title Year (down) Publication Volume Times cited Additional Links Links
Georgieva, V.; Bogaerts, A. Negative ion behavior in single- and dual-frequency plasma etching reactors: particle-in-cell/Monte Carlo collision study 2006 Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics 73 7 UA library record; WoS full record; WoS citing articles url doi
Georgieva, V.; Bogaerts, A. Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model 2006 Plasma sources science and technology 15 35 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Bogaerts, A. Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics 2005 Journal of applied physics 98 75 UA library record; WoS full record; WoS citing articles doi
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