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TEM characterization of extended defects induced in Si wafers by H-plasma treatment”. Ghica C, Nistor LC, Bender H, Richard O, Van Tendeloo G, Ulyashin A, Journal of physics: D: applied physics 40, 395 (2007). http://doi.org/10.1088/0022-3727/40/2/016
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Characterization of {111} planar defects induced in silicon by hydrogen plasma treatments”. Ghica C, Nistor LC, Bender H, Richard O, Van Tendeloo G, Ulyashin A;, Philosophical magazine 86, 5137 (2006). http://doi.org/10.1080/14786430600801443
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