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“Dynamics of nanoclustering in Te+ implanted Si after application of high frequency electromagnetic field and thermal annealing”. Kalitzova M, Lebedev OI, Zollo G, Gesheva K, Vlakhov E, Marinov Y, Ivanova T;, Applied physics A : materials science &, processing 91, 515 (2008). http://doi.org/10.1007/s00339-008-4441-2
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