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Author van den Bos, K.H.W.; Janssens, L.; De Backer, A.; Nellist, P.D.; Van Aert, S.
Title The atomic lensing model: new opportunities for atom-by-atom metrology of heterogeneous nanomaterials Type A1 Journal article
Year (down) 2019 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy
Volume 203 Issue Pages 155
Keywords A1 Journal article; Electron microscopy for materials research (EMAT)
Abstract The atomic lensing model has been proposed as a promising method facilitating atom-counting in heterogeneous nanocrystals [1]. Here, image simulations will validate the model, which describes dynamical diffraction as a superposition of individual atoms focussing the incident electrons. It will be demonstrated that the model is reliable in the annular dark field regime for crystals having columns containing dozens of atoms. By using the principles of statistical detection theory, it will be shown that this model gives new opportunities for detecting compositional differences.
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Corporate Author Thesis
Publisher Place of Publication Editor
Language Wos 000465021000020 Publication Date 2018-12-06
Series Editor Series Title Abbreviated Series Title
Series Volume Series Issue Edition
ISSN 0304-3991 ISBN Additional Links UA library record; WoS full record; WoS citing articles
Impact Factor 2.843 Times cited 4 Open Access OpenAccess
Notes The authors acknowledge financial support from the Research Foundation Flanders (FWO, Belgium) through project fundings (G.0369.15N, G.0502.18N and WO.010.16N), and by personal grants to K.H.W. van den Bos and A. De Backer. This project has received funding from the European Research Council (ERC) under the European Unions Horizon 2020 research and innovation programme (grant agreement No. 770887). Approved Most recent IF: 2.843
Call Number EMAT @ emat @UA @ admin @ c:irua:155721 Serial 5074
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