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Author Idrissi, H.; Turner, S.; Mitsuhara, M.; Wang, B.; Hata, S.; Coulombier, M.; Raskin, J.-P.; Pardoen, T.; Van Tendeloo, G.; Schryvers, D.
Title Point defect clusters and dislocations in FIB irradiated nanocrystalline aluminum films : an electron tomography and aberration-corrected high-resolution ADF-STEM study Type A1 Journal article
Year (down) 2011 Publication Microscopy and microanalysis Abbreviated Journal Microsc Microanal
Volume 17 Issue 6 Pages 983-990
Keywords A1 Journal article; Electron microscopy for materials research (EMAT)
Abstract Focused ion beam (FIB) induced damage in nanocrystalline Al thin films has been characterized using advanced transmission electron microscopy techniques. Electron tomography was used to analyze the three-dimensional distribution of point defect clusters induced by FIB milling, as well as their interaction with preexisting dislocations generated by internal stresses in the Al films. The atomic structure of interstitial Frank loops induced by irradiation, as well as the core structure of Frank dislocations, has been resolved with aberration-corrected high-resolution annular dark-field scanning TEM. The combination of both techniques constitutes a powerful tool for the study of the intrinsic structural properties of point defect clusters as well as the interaction of these defects with preexisting or deformation dislocations in irradiated bulk or nanostructured materials.
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Corporate Author Thesis
Publisher Place of Publication Cambridge, Mass. Editor
Language Wos 000297832300018 Publication Date 2011-10-27
Series Editor Series Title Abbreviated Series Title
Series Volume Series Issue Edition
ISSN 1431-9276;1435-8115; ISBN Additional Links UA library record; WoS full record; WoS citing articles
Impact Factor 1.891 Times cited 25 Open Access
Notes Iap; Fwo Approved Most recent IF: 1.891; 2011 IF: 3.007
Call Number UA @ lucian @ c:irua:93627 Serial 2653
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