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Author Morais, E.; Bogaerts, A. pdf  url
doi  openurl
  Title Modelling the dynamics of hydrogen synthesis from methane in nanosecond‐pulsed plasmas Type A1 Journal Article
  Year (down) 2024 Publication Plasma Processes and Polymers Abbreviated Journal Plasma Processes & Polymers  
  Volume 21 Issue 1 Pages  
  Keywords A1 Journal Article; chemical kinetics model, hydrogen, methane, nanosecond pulsed discharges, reaction mechanism; Plasma, laser ablation and surface modeling Antwerp (PLASMANT) ;  
  Abstract A chemical kinetics model was developed to characterise the gas‐phase dynamics of H<sub>2</sub>production in nanosecond‐pulsed CH<sub>4</sub>plasmas. Pulsed behaviour was observed in the calculated electric field, electron temperature and species densities at all pressures. The model agrees reasonably with experimental results, showing CH<sub>4</sub>conversion at 30% and C<sub>2</sub>H<sub>2</sub>and H<sub>2</sub>as major products. The underlying mechanisms in CH<sub>4</sub>dissociation and H<sub>2</sub>formation were analysed, highlighting the large contribution of vibrationally excited CH<sub>4</sub>and H<sub>2</sub>to coupling energy from the plasma into gas‐phase heating, and revealing that H<sub>2</sub>synthesis is not affected by applied pressure, with selectivity remaining unchanged at ~42% in the 1–5 bar range.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Editor  
  Language Wos 001091258700001 Publication Date 2023-10-27  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 1612-8850 ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 3.5 Times cited Open Access  
  Notes We gratefully acknowledge financial support by the Flemish Government through the Moonshot cSBO project “Power‐to‐Olefins” (P2O; HBC.2020.2620) and funding from the Independent Research Fund Denmark (project nr. 0217‐00231B). Approved Most recent IF: 3.5; 2024 IF: 2.846  
  Call Number PLASMANT @ plasmant @c:irua:201192 Serial 8983  
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Author Morais, E.; Delikonstantis, E.; Scapinello, M.; Smith, G.; Stefanidis, G.D.; Bogaerts, A. pdf  url
doi  openurl
  Title Methane coupling in nanosecond pulsed plasmas: Correlation between temperature and pressure and effects on product selectivity Type A1 Journal Article
  Year (down) 2023 Publication Chemical engineering journal Abbreviated Journal  
  Volume 462 Issue Pages 142227  
  Keywords A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT)  
  Abstract We present a zero-dimensional kinetic model to characterise specifically the gas-phase dynamics of methane

conversion in a nanosecond pulsed discharge (NPD) plasma reactor. The model includes a systematic approach to

capture the nanoscale power discharges and the rapid ensuing changes in electric field, gas and electron temperature,

as well as species densities. The effects of gas temperature and reactor pressure on gas conversion and

product selectivity are extensively investigated and validated against experimental work. We discuss the

important reaction pathways and provide an analysis of the dynamics of the heating and cooling mechanisms. H

radicals are found to be the most populous plasma species and they participate in hydrogenation and dehydrogenation

reactions, which are the dominant recombination reactions leading to C2H4 and C2H2 as main

products (depending on the pressure).
 
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Editor  
  Language Wos 000983631500001 Publication Date 2023-03-02  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 1385-8947 ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 15.1 Times cited Open Access OpenAccess  
  Notes We gratefully acknowledge financial support by the Flemish Government through the Moonshot cSBO project “Power-to-Olefins” (P2O; HBC.2020.2620). Approved Most recent IF: 15.1; 2023 IF: 6.216  
  Call Number PLASMANT @ plasmant @c:irua:195881 Serial 7246  
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