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Author
Title
Year
Publication
Volume
Times cited
Additional Links
Georgieva, V.
;
Bogaerts, A.
Negative ion behavior in single- and dual-frequency plasma etching reactors: particle-in-cell/Monte Carlo collision study
2006
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics
73
7
UA library record
;
WoS full record
;
WoS citing articles
Georgieva, V.
;
Bogaerts, A.
Plasma characteristics of an Ar/CF
4
/N
2
discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model
2006
Plasma sources science and technology
15
35
UA library record
;
WoS full record
;
WoS citing articles
Georgieva, V.
;
Bogaerts, A.
Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics
2005
Journal of applied physics
98
75
UA library record
;
WoS full record
;
WoS citing articles
