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Author Lenaerts, J.; van Vaeck, L.; Gijbels, R.; Van Luppen, J.
Title Comparison of mono- and polyatomic primary ions for the characterization of organic dye overlayers with static secondary ion mass spectrometry Type A1 Journal article
Year (down) 2004 Publication Rapid communications in mass spectrometry Abbreviated Journal Rapid Commun Mass Sp
Volume 18 Issue 3 Pages 257-264
Keywords A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT)
Abstract Organic carbocyanine dye coatings have been analyzed by time-of-flight static secondary ion mass spectrometry (TOF-S-SIMS) using three types of primary ions: Ga+ operating at 25 keV, and Xe+ and SF5+ both operating at 9 keV. Secondary ion yields obtained with these three primary ions have been compared for coatings with different layer thickness, varying from (sub)-monolayer to multilayers, on different substrates (Si, Ag and AgBr cubic microcrystals). For (sub)-monolayers deposited on Ag, Xe+ and SF5+ primary ions generate similar precursor ion intensities, but with Ga+ slightly lower precursor ion intensities were obtained. Thick coatings on Ag as well as mono- and multilayers on Si produce the highest precursor and fragment ion intensities with the polyatomic primary ion. The yield difference between SF5+ and Xe+ can reach a factor of 6. In comparison with Ga+, yield enhancements by up to a factor of 180 are observed with SF5+. For the mass spectrometric analysis of dye layers on AgBr microcrystals, SF5+ again proves to be the primary ion of choice. Copyright (C) 2004 John Wiley Sons, Ltd.
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Corporate Author Thesis
Publisher Place of Publication London Editor
Language Wos 000188695200004 Publication Date 2004-01-28
Series Editor Series Title Abbreviated Series Title
Series Volume Series Issue Edition
ISSN 0951-4198;1097-0231; ISBN Additional Links UA library record; WoS full record; WoS citing articles
Impact Factor 1.998 Times cited 5 Open Access
Notes Approved Most recent IF: 1.998; 2004 IF: 2.750
Call Number UA @ lucian @ c:irua:103759 Serial 432
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