| Home | << 1 >> |
|
| Record | |||||
|---|---|---|---|---|---|
| Author | Georgieva, V.; Bogaerts, A. | ||||
| Title | Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics | Type | A1 Journal article | ||
Year  |
2005 | Publication | Journal of applied physics | Abbreviated Journal | J Appl Phys |
| Volume | 98 | Issue | 2 | Pages | 023308,1-13 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | |||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | American Institute of Physics | Place of Publication | New York, N.Y. | Editor | |
| Language | Wos | 000230931500016 | Publication Date | 2005-07-27 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0021-8979; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 2.068 | Times cited | 75 | Open Access | |
| Notes | Approved | Most recent IF: 2.068; 2005 IF: 2.498 | |||
| Call Number | UA @ lucian @ c:irua:53575 | Serial | 2404 | ||
| Permanent link to this record | |||||