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| Author | Brault, P.; Neyts, E.C. | ||||
| Title | Molecular dynamics simulations of supported metal nanocatalyst formation by plasma sputtering | Type | A1 Journal article | ||
Year  |
2015 | Publication | Catalysis today | Abbreviated Journal | Catal Today |
| Volume | 256 | Issue | 256 | Pages | 3-12 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | Magnetron sputtering is a widely used physical vapor deposition technique for deposition and formation of nanocatalyst thin films and clusters. Nevertheless, so far only few studies investigated this formation process at the fundamental level. We here review atomic scale molecular dynamics simulations aimed at elucidating the nanocatalyst growth process through magnetron sputtering. We first introduce the basic magnetron sputtering background and machinery of molecular dynamics simulations, and then describe the studies conducted in this field so far. We also present a perspective view on how the field may be developed further. | ||||
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| Corporate Author | Thesis | ||||
| Publisher | Place of Publication | Amsterdam | Editor | ||
| Language | Wos | 000360085300002 | Publication Date | 2015-02-28 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0920-5861; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 4.636 | Times cited | 18 | Open Access | |
| Notes | Approved | Most recent IF: 4.636; 2015 IF: 3.893 | |||
| Call Number | c:irua:127408 | Serial | 2174 | ||
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