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| Author | Ghica, C.; Nistor, L.; Bender, H.; Steegen, A.; Lauwers, A.; Maex, K.; van Landuyt, J. | ||||
| Title | In situ transmission electron microscopy study of the silicidation process in Co thin films on patterned (001) Si substrates | Type | A1 Journal article | ||
Year  |
2001 | Publication | Journal of materials research | Abbreviated Journal | J Mater Res |
| Volume | 16 | Issue | 3 | Pages | 701-708 |
| Keywords | A1 Journal article; Electron microscopy for materials research (EMAT) | ||||
| Abstract | The results of an in situ transmission electron microscopy study of the formation of Co-silicides on patterned (001) Si substrates are discussed. It is shown that the results of the in situ heating experiments agreed very well with the data based on standard rapid thermal annealing experiments. Fast heating rates resulted in better definition of the silicide lines. Also, better lines were obtained for samples that received already a low-temperature ex situ anneal. A Ti cap layer gave rise to a higher degree of epitaxy in the CoSi2 silicide. | ||||
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| Corporate Author | Thesis | ||||
| Publisher | Place of Publication | New York, N.Y. | Editor | ||
| Language | Wos | 000167407200011 | Publication Date | 2008-03-06 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0884-2914;2044-5326; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 1.673 | Times cited | 4 | Open Access | |
| Notes | Approved | Most recent IF: 1.673; 2001 IF: 1.539 | |||
| Call Number | UA @ lucian @ c:irua:103926 | Serial | 1588 | ||
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