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“Stabilization of the cubic phase of HfO2 by Y addition in films grown by metal organic chemical vapor deposition”. Rauwel E, Dubourdieu C, Holländer B, Rochat N, Ducroquet F, Rossell MD, Van Tendeloo G, Pelissier B, Applied physics letters 89, 012902 (2006). http://doi.org/10.1063/1.2216102
Abstract: Addition of yttrium in HfO(2) thin films prepared on silicon by metal organic chemical vapor deposition is investigated in a wide compositional range (2.0-99.5 at. %). The cubic structure of HfO(2) is stabilized for 6.5 at. %. The permittivity is maximum for yttrium content of 6.5-10 at. %; in this range, the effective permittivity, which results from the contribution of both the cubic phase and silicate phase, is of 22. These films exhibit low leakage current density (5x10(-7) A/cm(2) at -1 V for a 6.4 nm film). The cubic phase is stable upon postdeposition high temperature annealing at 900 degrees C under NH(3). (c) 2006 American Institute of Physics.
Keywords: A1 Journal article; Electron microscopy for materials research (EMAT)
Impact Factor: 3.411
Times cited: 78
DOI: 10.1063/1.2216102
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