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Evolution of impurity clusters and photographic sensitivity”. Oleshko VP, Gijbels RH, Bilous VM, Jacob WA, Alfimov MV, Zhurnal nauchnoj prikladnoj fotografii i kinematografii 45, 1 (2000)
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Evolution of impurity clusters and mechanism of formation of photographic sensitivity”. Oleshko VP, Gijbels RH, Bilous VM, Jacob WA, Alfimov MV Antwerp, page 275 (1998).
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Combined characterization of nanostructures by AEM and STM”. Oleshko V, Gijbels R, Jacob W, Alfimov M, Mikrochimica acta: supplementum 13, 435 (1996)
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Characterization of complex silver halide photographic systems by means of analytical electron microscopy”. Oleshko V, Gijbels R, Jacob W, Alfimov M, Microbeam analysis 4, 1 (1995)
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Complex structural and analytical characterization of silver halide photographic systems by means of analytical electron microscopy”. Oleshko V, Gijbels R, Jacob W, Alfimov M Editions de physique, Les Ulis, page 701 (1994).
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Characterization of complex silver halide photographic systems by means of analytical electron microscopy”. Oleshko V, Gijbels R, Jacob W, Alfimov M, Microbeam analysis 3, 1 (1994)
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