| Dubourdieu, C.; Rauwel, E.; Roussel, H.; Ducroquet, F.; Hollaender, B.; Rossell, M.; Van Tendeloo, G.; Lhostis, S.; Rushworth, S. |
Addition of yttrium into HfO2 films: microstructure and electrical properties |
2009 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
27 |
29 |
UA library record; WoS full record; WoS citing articles |
