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Title
Year
Publication
Volume
Times cited
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Tinck, S.
;
Altamirano-Sánchez, E.
;
De Schepper, P.
;
Bogaerts, A.
Formation of a nanoscale SiO
2
capping layer on photoresist lines with an Ar/SiCl
4
/O
2
inductively coupled plasma : a modeling investigation
2014
Plasma processes and polymers
11
1
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