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Author Kuppens, T.; Van Dael, M.; Maggen, J.; Vanreppelen, K.; Yperman, J.; Carleer, R.; Elen, H.; Van Passel, S.
Title Techno-economic assessment of different conversion pathways for pyrolysis char from pig manure Type P1 Proceeding
Year (down) 2014 Publication Abbreviated Journal
Volume Issue Pages 901-911
Keywords P1 Proceeding; Engineering sciences. Technology
Abstract The amount of animal manure that can be brought back to agricultural land is limited by legislation. Because pig manure is available in too large quantities in some areas, we investigate the techno-economic feasibility of converting it into valuable products. First, slurry is separated in water, a thick fraction and a fertilizer concentrate poor in phosphate. Then, the thick fraction is dried and pyrolyzed. Our goal is to identify the optimal pyrolysis and activation conditions for the production of biochar or activated carbon. The latter has interesting adsorption characteristics due to the presence of nitrogen. It can also be used as a soil amendment as it improves biomass quantity and quality. On top, it immobilizes toxic elements and stores carbon in the soil. Char thus has many interesting characteristics and can be valued in different ways. The economic feasibility has been explored by a first techno-economic modelling iteration. The critical factors influencing the feasibility are identified by Monte Carlo simulations for further improvement of the process design.
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Corporate Author Thesis
Publisher Place of Publication Editor
Language Wos Publication Date
Series Editor Series Title Abbreviated Series Title 22nd European Biomass Conference and Exhibition : Setting the Course for a Biobased Economy, 23-26 June 2014, Hamburg, Germany : conference proceedings
Series Volume Series Issue Edition
ISSN ISBN Additional Links UA library record; WoS full record
Impact Factor Times cited Open Access
Notes ; ; Approved Most recent IF: NA
Call Number UA @ admin @ c:irua:127546 Serial 6263
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Author Delabie, A.; Jayachandran, S.; Caymax, M.; Loo, R.; Maggen, J.; Pourtois, G.; Douhard, B.; Conard, T.; Meersschaut, J.; Lenka, H.; Vandervorst, W.; Heyns, M.;
Title Epitaxial chemical vapor deposition of silicon on an oxygen monolayer on Si(100) substrates Type A1 Journal article
Year (down) 2013 Publication ECS solid state letters Abbreviated Journal Ecs Solid State Lett
Volume 2 Issue 11 Pages P104-P106
Keywords A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT)
Abstract Crystalline superlattices consisting of alternating periods of Si layers and O-atomic layers are potential new channel materials for scaled CMOS devices. In this letter, we investigate Chemical Vapor Deposition (CVD) for the controlled deposition of O-atoms with O-3 as precursor on Si(100) substrates and Si epitaxy on the O-layer. The O-3 reaction at 50 degrees C on the H-terminated Si results in the formation of Si-OH and/or Si-O-Si-H surface species with monolayer O-content. Defect-free epitaxial growth of Si on an O-layer containing 6.4E+14 O-atoms/cm(2) is achieved from SiH4 at 500 degrees C. (C) 2013 The Electrochemical Society. All rights reserved.
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Corporate Author Thesis
Publisher Electrochemical society Place of Publication Pennington (N.J.) Editor
Language Wos 000324582600006 Publication Date 2013-09-06
Series Editor Series Title Abbreviated Series Title
Series Volume Series Issue Edition
ISSN 2162-8742;2162-8750; ISBN Additional Links UA library record; WoS full record; WoS citing articles
Impact Factor 1.184 Times cited 12 Open Access
Notes Approved Most recent IF: 1.184; 2013 IF: 0.781
Call Number UA @ lucian @ c:irua:111208 Serial 1070
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