| |
Author |
Title |
Year |
Publication |
Volume  |
Times cited |
Additional Links |
Links |
|
|
Bogaerts, A.; Gijbels, R. |
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces |
2002 |
Plasma sources science and technology |
11 |
51 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Relative sensitivity factors in glow discharge mass spectrometry: the role of charge transfer ionization |
1996 |
Journal of analytical atomic spectrometry |
11 |
38 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Modeling of glow discharge sources with flat and pin cathodes and implications for mass spectrometric analysis |
1997 |
Journal of the American Society of Mass Spectrometry |
8 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Modeling network for argon glow discharge plasmas with copper cathode |
2002 |
|
|
|
UA library record |
|
|
|
Bogaerts, A.; Gijbels, R. |
Modeling network for argon glow discharges: the output cannot be better than the input |
2000 |
|
|
1 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Modelling of a direct current glow discharge: combined models for the electrons, argon ions and metastables |
1995 |
|
|
|
UA library record |
|
|
|
Bogaerts, A.; Gijbels, R. |
Numerical modelling of analytical glow discharges |
2003 |
|
|
|
UA library record |
|
|
|
Bogaerts, A.; Gijbels, R. |
Plasma models |
1997 |
|
|
|
UA library record |
|
