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Mixed valent iron oxides with the 0201-1201 intergrowth structure: (Pb1-xTlx)Sr4Fe2O9 (0≤x≤1)”. Daniel P, Barbey L, Groult D, Nguyen N, Van Tendeloo G, Raveau B, European journal of solid state and inorganic chemistry 31, 235 (1994)
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Mn(I) in an extended oxide : the synthesis and characterization of La1-xCaxMnO2+\delta (0.6\leq x\leq1)”. Dixon E, Hadermann J, Ramos S, Goodwin AL, Hayward MA, Journal of the American Chemical Society 133, 18397 (2011). http://doi.org/10.1021/ja207616c
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Mobility collapse in undoped and Si-doped GaN grown by LP-MOVPE”. Bougrioua Z, Farvacque J-L, Moerman I, Demeester P, Harris JJ, Lee K, Van Tendeloo G, Lebedev O, Trush EJ, Physica status solidi: B: basic research 216, 571 (1999). http://doi.org/10.1002/(SICI)1521-3951(199911)216:1<571::AID-PSSB571>3.0.CO;2-K
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The mode-deviation effect of trapped spinor bose gas beyond mean field theory”. Xu Y, Jia D-J, Chen Z, Gao Y, Li F-S, International journal of modern physics: B: condensed matter physics, statistical physics, applied physics 18, 1339 (2004). http://doi.org/10.1142/S0217979204024719
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A model based atomic resolution tomographic algorithm”. van den Broek W, Van Aert S, van Dyck D, Ultramicroscopy 109, 1485 (2009). http://doi.org/10.1016/j.ultramic.2009.08.003
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Model-based determination of dielectric function by STEM low-loss EELS”. Zhang L, Turner S, Brosens F, Verbeeck J, Physical review : B : condensed matter and materials physics 81, 035102 (2010). http://doi.org/10.1103/PhysRevB.81.035102
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Model-based electron microscopy : from images toward precise numbers for unknown structure parameters”. Van Aert S, van den Broek W, Goos P, van Dyck D, Micron 43, 509 (2012). http://doi.org/10.1016/j.micron.2011.10.019
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Model-based quantification of EELS: is standardless quantification possible?”.Verbeeck J, Bertoni G, Microchimica acta 161, 439 (2008). http://doi.org/10.1007/s00604-008-0948-7
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Model based quantification of EELS spectra”. Verbeeck J, Van Aert S, Ultramicroscopy 101, 207 (2004). http://doi.org/10.1016/j.ultramic.2004.06.004
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Model-based quantification of EELS spectra: including the fine structure”. Verbeeck J, Van Aert S, Bertoni G, Ultramicroscopy 106, 976 (2006). http://doi.org/10.1016/j.ultramic.2006.05.006
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Model-based quantification of EELS spectra: treating the effect of correlated noise”. Verbeeck J, Bertoni G, Ultramicroscopy 108, 74 (2008). http://doi.org/10.1016/j.ultramic.2007.03.004
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A model based reconstruction technique for depth sectioning with scanning transmission electron microscopy”. van den Broek W, Van Aert S, van Dyck D, Ultramicroscopy 110, 548 (2010). http://doi.org/10.1016/j.ultramic.2009.09.008
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A model determining optimal doping concentration and material's band gap of tunnel field-effect transistors”. Vandenberghe WG, Verhulst AS, Kao K-H, De Meyer K, Sorée B, Magnus W, Groeseneken G, Applied physics letters 100, 193509 (2012). http://doi.org/10.1063/1.4714544
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Modeling adatom surface processes during crystal growth: a new implementation of the Metropolis Monte Carlo algorithm”. Eckert M, Neyts E, Bogaerts A, CrystEngComm 11, 1597 (2009). http://doi.org/10.1039/b822973m
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Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime”. Zhang Y-R, Tinck S, De Schepper P, Wang Y-N, Bogaerts A, Journal of vacuum science and technology: A: vacuum surfaces and films 33, 021310 (2015). http://doi.org/10.1116/1.4906819
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Modeling and experimental study of trichloroethylene abatement with a negative direct current corona discharge”. Vandenbroucke AM, Aerts R, Van Gaens W, De Geyter N, Leys C, Morent R, Bogaerts A, Plasma chemistry and plasma processing 35, 217 (2015). http://doi.org/10.1007/s11090-014-9584-7
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Modeling aspects of plasma-enhanced chemical vapor deposition of carbon-based materials”. Neyts E, Mao M, Eckert M, Bogaerts A CRC Press, Boca Raton, Fla, page 245 (2012).
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Modeling drive currents and leakage currents : a dynamic approach”. Magnus W, Brosens F, Sorée B, Journal of computational electronics 8, 307 (2009). http://doi.org/10.1007/s10825-009-0296-9
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Modeling network for argon glow discharge plasmas with copper cathode”. Bogaerts A, Gijbels R Nova, New York, page 1 (2002).
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Modeling network for argon glow discharges: the output cannot be better than the input”. Bogaerts A, Gijbels R American Institute of Physics, Melville, N.Y., page 49 (2000).
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Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model”. Herrebout D, Bogaerts A, Yan M, Gijbels R, Goedheer W, Vanhulsel A, Journal of applied physics 92, 2290 (2002). http://doi.org/10.1063/1.1500789
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Modeling of a dielectric barrier discharge used as a flowing chemical reactor”. Petrovic D, Martens T, van Dijk J, Brok WJM, Bogaerts A, , 262 (2008)
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Modeling of a dielectric barrier discharge used as a flowing chemical reactor”. Petrović, D, Martens T, van Dijk J, Brok WJM, Bogaerts A, Journal of physics : conference series 133, 012023 (2008). http://doi.org/10.1088/1742-6596/133/1/012023
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Modeling of a microsecond pulsed glow discharge: behavior of the argon excited levels and of the sputtered copper atoms and ions”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 16, 239 (2001). http://doi.org/10.1039/b009289o
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Modeling of a millisecond pulsed glow discharge: investigation of the afterpeak”. Bogaerts A, Gijbels R, Jackson GP, Journal of analytical atomic spectrometry 18, 533 (2003). http://doi.org/10.1039/b212606k
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Modeling of argon direct current glow discharges and comparison with experiment: how good is the agreement?”.Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 13, 945 (1998). http://doi.org/10.1039/a800329g
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Modeling of bombardment induced oxidation of silicon”. de Witte H, Vandervorst W, Gijbels R, Journal of applied physics 89, 3001 (2001). http://doi.org/10.1063/1.1344581
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Modeling of bombardment induced oxidation of silicon with and without oxygen flooding”. de Witte H, Vandervorst W, Gijbels R, , 327 (1998)
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Modeling of chemical processes in the low pressure capacitive radio frequency discharges in a mixture of Ar/C2H2”. Ariskin DA, Schweigert IV, Alexandrov AL, Bogaerts A, Peeters FM, Journal of applied physics 105, 063305 (2009). http://doi.org/10.1063/1.3095760
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Modeling of gas discharge plasmas: What can we learn from it?”.Bogaerts A, de Bleecker K, Kolev I, Madani M, Surface and coatings technology 200, 62 (2005). http://doi.org/10.1016/j.surfcoat.2005.02.057
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