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Author Ignatova, V.A.; Möller, W.; Conard, T.; Vandervorst, W.; Gijbels, R.
Title Interpretation of TOF-SIMS depth profiles from ultrashallow high-k dielectric stacks assisted by hybrid collisional computer simulation Type A1 Journal article
Year 2005 Publication Applied physics A : materials science & processing Abbreviated Journal Appl Phys A-Mater
Volume 81 Issue 1 Pages 71-77
Keywords A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT)
Abstract
Address
Corporate Author Thesis
Publisher (up) Place of Publication Heidelberg Editor
Language Wos 000228794000013 Publication Date 2005-04-11
Series Editor Series Title Abbreviated Series Title
Series Volume Series Issue Edition
ISSN 0947-8396;1432-0630; ISBN Additional Links UA library record; WoS full record; WoS citing articles
Impact Factor 1.455 Times cited 4 Open Access
Notes Approved Most recent IF: 1.455; 2005 IF: 1.990
Call Number UA @ lucian @ c:irua:60085 Serial 1711
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