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| Author | Stuer, C.; van Landuyt, J.; Bender, H.; de Wolf, I.; Rooyackers, R.; Badenes, G. | ||||
| Title | Investigation by convergent beam electron diffraction of the stress around shallow trench isolation structures | Type | A1 Journal article | ||
| Year | 2001 | Publication | Journal of the electrochemical society | Abbreviated Journal | J Electrochem Soc |
| Volume | 148 | Issue | 11 | Pages | G597-G601 |
Keywords  |
A1 Journal article; Electron microscopy for materials research (EMAT) | ||||
| Abstract | Convergent beam electron diffraction (CBED) is used in this study to investigate the stress distribution around shallow trench isolation (STI) structures. Attention is given to the influence of the different processing parameters and the width and spacing of the structures. The use of a wet or a dry pregate oxidation is found to have a strong influence on the stress behavior. Isolated lines show more stress, leading to the formation of defects in the silicon substrate if a wet pregate oxidation is used. The CBED analyses are compared with micro-Raman and bright-field transmission electron microscopy measurements. (C) 2001 The Electrochemical Society. | ||||
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| Corporate Author | Thesis | ||||
| Publisher | Place of Publication | New York, N.Y. | Editor | ||
| Language | Wos | 000171653100038 | Publication Date | 2002-07-26 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0013-4651; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.259 | Times cited | 13 | Open Access | |
| Notes | Approved | Most recent IF: 3.259; 2001 IF: 2.033 | |||
| Call Number | UA @ lucian @ c:irua:103394 | Serial | 1725 | ||
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