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| Author | Béché, A.; Rouviere, J.L.; Barnes, J.P.; Cooper, D. | ||||
| Title | Strain measurement at the nanoscale : comparison between convergent beam electron diffraction, nano-beam electron diffraction, high resolution imaging and dark field electron holography | Type | A1 Journal article | ||
| Year | 2013 | Publication | Ultramicroscopy | Abbreviated Journal | Ultramicroscopy |
| Volume | 131 | Issue | Pages | 10-23 | |
| Keywords | A1 Journal article; Electron microscopy for materials research (EMAT) | ||||
| Abstract | Convergent beam electron diffraction (CBED), nano-beam electron diffraction (NBED or NBD), high resolution imaging (HRTEM and HRSTEM) and dark field electron holography (DFEH or HoloDark) are five TEM based techniques able to quantitatively measure strain at the nanometer scale. In order to demonstrate the advantages and disadvantages of each technique, two samples composed of epitaxial silicon-germanium layers embedded in a silicon matrix have been investigated. The five techniques are then compared in terms of strain precision and accuracy, spatial resolution, field of view, mapping abilities and ease of performance and analysis. (C) 2013 Elsevier By. All rights reserved. | ||||
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| Publisher | Place of Publication | Amsterdam | Editor | ||
| Language | Wos | 000322631200002 | Publication Date | 2013-04-06 | |
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| ISSN | 0304-3991; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 2.843 | Times cited | 73 | Open Access | |
| Notes | Approved | Most recent IF: 2.843; 2013 IF: 2.745 | |||
| Call Number | UA @ lucian @ c:irua:109774 | Serial | 3171 | ||
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