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Author (up) Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. doi  openurl
  Title Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux Type A1 Journal article
  Year 2005 Publication Plasma sources science and technology Abbreviated Journal Plasma Sources Sci T  
  Volume 14 Issue Pages 191-200  
  Keywords A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT)  
  Abstract  
  Address  
  Corporate Author Thesis  
  Publisher Institute of Physics Place of Publication Bristol Editor  
  Language Wos 000227652500021 Publication Date 2005-02-05  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0963-0252;1361-6595; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 3.302 Times cited 9 Open Access  
  Notes Approved Most recent IF: 3.302; 2005 IF: 1.798  
  Call Number UA @ lucian @ c:irua:50478 Serial 1480  
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